Used NIKON NSR 1755 i7A #293681784 for sale

NIKON NSR 1755 i7A wafer stepper is an advanced optical imaging equipment designed for high-precision lithography applications. This system is capable of producing highly accurate patterns and images on substrates such as silicon, glass and other materials used for semiconductor fabrication. It features proprietary NIKON imaging technology, including an auto alignment unit, and high-speed auto-focus with compensation for mis-alignments. NIKON NSR 1755I7A is ideal for production processes and research applications, such as nanolithography, electron-beam lithography, VLSI fabrication, thin film deposition and metrology. NSR-1755I7A features advanced optics for imaging resolution below 25nm, and a high-precision stage for substrate movements of up to 100mm. The user-friendly and intuitive graphical user interface allows easy and simple operation. The stepper also has an advanced process control machine with standard semiconductor recipes, making it ideal for large production environments. The tool is compliant with ISO/JIS, SEMI and IEC standards. NIKON NSR 1755 I 7 A includes an integrated dual exposure asset with an ultra-high-speed scanning capability. This model is capable of processing two fields simultaneously, and can reduce overlay errors to less than 0.1 microns for lithography tools. The equipment is also capable of exposure using dosing exposure, a method of illumination and exposure which allows exposure of all lithography layers in one pass, increasing throughput and increasing yield. This system incorporates a cleaning unit designed to reduce contamination during patterning cycles. The nanoscale cleaning unit results in minimized surface contamination and allows higher throughput and excellent process control. The stepper also has various functions, including exposure time control, shutter control, and a choice of multiple imaging wavelengths. NSR-1755 I 7 A wafer stepper is a versatile machine that offers high-precision, high-throughput imaging with minimal contamination and excellent process control. It is designed to maximize substrate throughput and yield, and is ideal for many semiconductor fabrication processes.