Used NIKON NSR 1755 i7A #293681785 for sale

NIKON NSR 1755 i7A is a cutting edge wafer stepper equipment ideal for precision microlithographic processing. It utilizes the latest in aligner, imaging and illumination technologies, to provide customers with the highest accuracy and yield. The system is equipped with an innovative wafer stage that is capable of achieving an accuracy of 4nm at any arbitrary point on the mask, with a repeatability of up to 1nm per cycle. This allows for less manual intervention and a lower cost of ownership over the life of the product. NIKON NSR 1755I7A also uses a high numerical aperture NA 1.35 lens unit to maximize image clarity for advanced feature detection and improved overlay accuracy. This lens machine is also capable of producing a 4 micron pitch resolution for critical area power regulations. In addition to its high accuracy and repeatability, NSR-1755I7A includes an advanced Digital Machining and Optical Machining Technology suite, providing users with a full range of features from intermediate to high complexity. Its advanced Digital Machining capabilities include 150nm pitch, multiple-pattern machining, auto alignment and partial exposure. Its Optical Machining capabilities further include a 100nm pitch, as well as 3D Wide SOR/WOM exposures and multi-aperture exposures. NIKON NSR-1755 I 7 A is designed to manage the entire process of wafer stepper lithography, from aligner setup to post exposure processing. It also offers a range of integrated process troubleshooting functions (Optical Alignment, Reliability Check, and Anomaly Detection Algorithm) and a broad selection of metrology, simulation, and analysis tools. This tool is ideally suited for the requirements of the most complex semiconductor and MEMS production applications, and its advanced specifications (including its high accuracy and repeatability, powerful Digital Machining and Optical Machining Technology suite, and integrated process troubleshooting functions) make it an ideal toolset for advanced wafer stepper lithography.