Used NIKON NSR 1755 i7A #9250068 for sale
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ID: 9250068
Wafer Size: 6"
Vintage: 1990
Stepper, 6"
Hard Disk Drive (HDD)
Control rack: Left
Wafer stage: Flat, 6"
Wafer stage screw: Ball
Wafer alignment: LSA
Auto focus: Single point
Wafer loader:
Flat, 6"
Type 1
Cassette (L+R)
Reticle size: 5"
Reticle microscope: 15 / 17.5 mm
Reticle loader: Normal
No expansion library
No PPD
No PD
Control temp: LATC and Chamber
Chamber: ASAHI S78
Chamber size: 1500
1990 vintage.
NIKON NSR 1755 i7A is a wafer stepper equipped with a high-performance projection lens for accurate and high-precision operations. This advanced equipment is designed for 15 nm nodes and below and features fully automated operation, superior overlay accuracy, and throughput up to 30% above the industry average. NIKON NSR 1755I7A also offers a wide range of elevation modes, from standard through to super-high-precision mode with nanometer-level accuracy. NSR-1755I7A features a new generation of projection optics based on neutral particle optics. This process enables operation at 15 nm nodes and below without increasing projection magnification. In addition, uniformity of the projection image across the entire field of view is also improved. With the addition of a CCD-based automated alignment system, this stepper offers highly accurate wafer alignment, resulting in improved overlay accuracy. NSR 1755I7A has a 12-inch wafer stage, equipped with an unparalleled run-down time of 2 seconds and a substrate tilt correction unit. This machine delivers maximum throughput and yield and is capable of operating at very low temperatures of -50°C, reducing the risk of temperature-dependent over-exposure of mask patterns. In addition, NIKON NSR-1755 I 7 A is equipped with a fully automated process control tool, enabling accurate and stable operations without manual intervention. It also features an advanced high-sensitivity infrared alignment asset, allowing for fast exposure alignment without the need for optical alignment patterns. With NIKON NSR 1755 I 7 A wafer stepper, complex mask patterns can be accurately and uniformly projected, giving an extremely high exposure quality. This, together with the model's high throughput, low cost of ownership and unsurpassed performance make it an ideal solution for high volume production of next-generation electronic devices.
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