Used NIKON NSR 1755 i7A #9254167 for sale

Manufacturer
NIKON
Model
NSR 1755 i7A
ID: 9254167
Wafer Size: 6"
Vintage: 1991
Stepper, 6" Hard Disk Drive (HDD) Control rack: Left Wafer stage: Flat, 6" Wafer stage screw: Ball screw Wafer alignment: LSA Auto focus: Single point Wafer loader: Flat, 6" Type 1 Inline and cassette (Left) Reticle size: 5" Reticle microscope: 15 / 17.5 mm Reticle loader: Normal No expansion library No PPD No PD Control temperature: LATC and Chamber Chamber: ASAHI S78 Chamber size: 1500 1991 vintage.
NIKON NSR 1755 i7A is a high-precision wafer stepper used for fabricating integrated circuits on semiconductor wafers in a cleanroom environment. It is an automated lithography tool that uses light to create patterns on the wafer surface according to a pre-programmed design. NIKON NSR 1755I7A is engineered to provide high patterning accuracy with an exposure area of 420mm and field size of 5.7um. NSR-1755I7A is equipped with two separate light sources. One of the sources is a KrF Exculite laser which provides a wavelength of 248nm and pulse length of 15ns. This source enables the machine to fabricate lithography patterns with high fidelity. NIKON NSR-1755I7A also features a Hamamatsu H8500 photomultiplier for detection of light intensity. Through this auxiliary source, NIKON NSR 1755 is able to accurately measure and control the light output of the KrF exculite laser. In addition to its high precision design, NSR 1755 i7A is also known for its large capacity. This wafer stepper is capable of stepping 2" - 6" wafers, as well as exposure patterns up to 400mm square. It is also capable of processing up to 30 wafers per hour. Furthermore, its exposure head is capable of accurate, repeatable step-and-repeat patterning with a 0.1µm maximum cell size. The machine also includes an advanced stage system which allows the user to quickly position the wafer in the desired coordinates. It also includes a wide range of user-configurable parameters, enabling precise wafer-level control. This Automated Precision Exposure System (APES) includes an auto-focus function which adjusts exposure settings to maintain consistently high speed and accuracy. NIKON NSR 1755 I 7 A is an extremely reliable wafer stepper that is suitable for demanding production environments. It is designed with advanced safety protocols which adhere to industry-standard safety regulations to ensure a safe cleanroom operation. Its low maintenance demands and robust design enable it to run in continuous operation over long periods. NSR 1755I7A is a reliable, high-performance wafer stepper that is ideal for fabricating intricate semiconductor components in a cleanroom environment. Its large capacity, high precision, and robust design make it one of the most reliable lithography systems available.
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