Used NIKON NSR 1755 i7B #293619990 for sale

NIKON NSR 1755 i7B wafer stepper is a state-of-the-art projection photolithography machine that is used to fabricate devices with feature sizes down to a few nanometers. It's a direct-drive six-field, single-wavelength lithography tool that supports the full lithographic cycle from EBR (Exposure Beam Route) to alignment and substrate flatness for each processed wafer. NIKON NSR-1755I7B utilizes an advanced projection lens, Reflection Objective (REX), and dual-ring homogenizer that provide superior low-mask distortion performance. This equipment features an industry-leading metrology suite that includes a programmable stage, XYZ wafer movement and focus detection, enabling accurate resist development and patterning on critical layers. The NRK 1755 i7B also supports innovative imaging technologies such as off-axis illumination, patterns generated by alignment models, and seamless automatic alignment. It integrates an interactive exposure command system, developer optimization, and wafer temperature control, making the entire process easier to manage. The stepper is reliable and supports high-quality device fabrication on thick substrates. The unit employs a field programmable gate array (FPGA) to ensure a short reticle-to-reticle exposure cycle, and its electromagnetic scanner-head technology allows for low-cost, automatically controlled set-up of exposure conditions. Its high-accuracy stepper motor control machine produces a stable exposure dose during operation. The from-field defect management tool contains a laser pattern scanner, defect monitor, and mid-field defect monitor. It can detect air-gap defects that may cause yield variations, and its image-processing engine displays images obtained from the defect monitor on the touch panel. NSR 1755 i7B also supports the ImagePLUS sensor asset which collects non-uniformity data on the inspected wafers, together with DefectReview software, which performs defect review. It also supports the AutoAlign model, which rapidly acquires pattern information while performing projection exposure, allowing fast adjustment of wafer registration. In conclusion, NSR-1755I7B wafer stepper is a reliable, state-of-the-art projection photolithography machine that can accurately fabricate devices with feature sizes down to a few nanometers. It supports a wide range of imaging technologies and is equipped with an industry-leading metrology suite, interactive exposure equipment, and automated alignment tools.