Used NIKON NSR 1755 i7B #9160458 for sale

NIKON NSR 1755 i7B Wafer Stepper is a high-performance immersion lithography imaging equipment primarily designed for mask and reticle level lithography applications. This wafer stepper is equipped with antistatic solder bump imaging technology, allowing for the production of fine detailed 3D imaging of even the smallest solder bumps. This system has a high-resolution camera of 82um that enables manufacturing of semiconductor chips with ultra-tight design rules. Furthermore, the on-axis alignment feature ensures maximum alignment accuracy, increasing die throughput. NIKON NSR-1755I7B Wafer Stepper is used to create a master pattern called a reticle, which is used to transfer an image to the wafers. This unit features a 25.4 mm reticle field area, allowing for precise imaging of large exposure fields and high precision imaging of small micro-devices such as memory chips. The reticles are usually made out of quartz making them highly efficient for image transfer to the wafers. This machine is equipped with an advanced auto focus control that monitors and corrects any defects in the focus plane while automatically detecting the die boundaries of the pattern. This makes this tool ideal for production with tight design rules and high yields. NSR 1755 i7B Wafer Stepper is designed for maximum efficiency and reliability under tough production conditions. With its high-speed laser projection asset, it is capable of up to 4,500 wafers per hour—a throughput of up to 1.6 GHz. The model features a control equipment that optimizes exposure conditions for each shot, increasing throughput and uniformity among the wafers. This control system is also capable of optimizing for exposure time, dose, and focus, offering absolute process control and stability. NSR-1755I7B Wafer Stepper is the perfect solution for wafer level imaging, providing high throughput, exceptional uniformity, and reliable results. It's a powerful, high-performance unit with advanced imaging features and optimized illumination, ensuring excellent die-to-die patterning with accuracy and uniformity. With its advanced auto focus control, it ensures good focus plane stability and makes this machine the perfect choice for the high-resolution needs of the modern semiconductor industry.