Used NIKON NSR 1755 i7B #9165599 for sale

NIKON NSR 1755 i7B wafer stepper is a groundbreaking tool that revolutionizes the semiconductor manufacturing industry by providing unsurpassed processes for high-precision alignment and lithography. The stepper has a scanning electron-beam deflector with a deflection accuracy of 0.6 μm and a maximum scan rate of 1.5 kHz, capable of providing exceptional process stability and image quality. The 7-axis, 2-column system also ensures alignment accuracy within 0.7 μm, consistently ensuring wafers are aligned with the highest precision. The motor driver In-Deflection Axis Scanning allows highly precise direct-drive control of the single-wafer stage for nanometer-level scanning. Its high efficiency also enables quick cycle times of 1.5 seconds per wafer. NIKON NSR-1755I7B also has an industry-leading resolution of 0.33 μm, covering almost 2.6x the range of a typical conventional wafer stepper. This resolution can be easily implemented to accurately align photomask patterns with the high-density transistor patterns on the wafer substrates. The instrument is equipped with an automated 4-axis centering program that automatically and precisely centers each wafer relative to the X and Y axes of the X-Y stage. This centering program can handle a maximum of 8 inches wafer sizes with no holes or alignment marks, and can be programmed to perform both manual and semi-automatic centering. NSR 1755 i7B has an open interface software that allows customization and optimization of processes such as capturing data, processing of wafer images, alignment procedures and repeat accuracy. This software also provides a graphically-driven operating environment which simplifies wafer and photomask processes. Overall, NSR-1755I7B is a revolutionary wafer stepper delivering superior accuracy in wafer alignment. It provides consistent high-resolution imaging, enabling shorter cycle times, higher yields and higher performance production.