Used NIKON NSR 1755 i7B #9236935 for sale

Manufacturer
NIKON
Model
NSR 1755 i7B
ID: 9236935
Stepper Resolution: 0.55 NA: 0.48 Exposure wave length: i-Line Reduction: 1/5 Expose field: 17.5 x 17.5 - 13.4 x 20.1 Alignment accuracy: 0.12 (|x|+3s).
NIKON NSR 1755 i7B is a top-of-the-line wafer stepper capable of high-precision processing of semiconductor wafers and other materials. It is the latest in a long line of precision machining equipment developed by NIKON for the semiconductor industry. NIKON NSR-1755I7B is an advanced lithography equipment featuring a high-resolution imaging system and advanced optics. It utilizes ASML's latest TwinScan platform to achieve a resolution up to 0.2 μm, which is significantly higher than conventional systems. The machine is equipped with a highly configurable two-layer photomask, and the whole unit is capable of nanometer-level resolution. NSR 1755 i7B has a wide range of configurations, allowing manufacturers to custom-fit their production needs. It is equipped with a step-and-repeat DieScope Inspection machine, an i-Line Die Tracer, and a pro-active Auto Inspection Module for quality control. It is also capable of production monitoring via a remote monitoring tool, simplifying quality control and ensuring automated processes are running without error. NSR-1755I7B is powered by a 300 watt pulse laser, allowing for a high degree of accuracy and speed for production. It features advanced technology such as high-accuracy multi-patterning, multi-layer exposure processing, and a variety of path-defining features suitable for complex manufacturing processes. NIKON NSR 1755 i7B is an excellent choice for manufacturers looking for a powerful and reliable high-resolution wafer stepper. With its advanced capabilities, the asset is capable of producing semiconductors with high quality and accuracy. The model offers a high degree of flexibility, allowing manufacturers to customize their production needs, and is simple to operate using its easy-to-use interface. When paired with the latest in photo imaging software, the equipment can produce extremely fine lines and patterns suitable for the most delicate applications.
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