Used NIKON NSR 1755 i7B #9279749 for sale
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ID: 9279749
Wafer Size: 6"
Stepper, 6"
Wafer type: Flat
Wafer loader type: Type I
Leveling system: Claw sub-system
Arm
Main body with chamber
Monitor
RA Microscope
Reticle loader:
Mask, 5"
Arm
Reticle library: Single film
13-Slot
Wafer stage:
Chuck, 6"
LC Mirror.
NIKON NSR 1755 i7B wafer stepper is a high-performance series of lithography equipment designed to provide enhanced fabrication capabilities for semiconductor device production. This system is a full-featured lithography platform featuring a fourth-generation scanner, a fully integrated lithography control system, and a suite of advanced lithography processes. It utilizes a patented two-stage architecture that enables high overlay precision and defect detection. NIKON NSR-1755I7B is equipped with advanced optics that provide accurate focus, feature recognition, and wafer alignment. The optics are also optimized for extended working distance and low steepness, ensuring no artifacts due to aberration. The advanced lithography platform is capable of delivering exposure times as fast as 10ms, allowing for higher throughput while maintaining superior image quality. NSR 1755 i7B comes pre-configured with NIKON most advanced lithography algorithms such as Impulsive Pattern Generator (IPG), Multi-Circle Exposure (MCE), and Scan Matching Algorithm (SMA). These algorithms enable optimal use of exposure resources, resulting in shorter throughput times. The wafer stepper also offers the fastest pattern recognition time, thereby reducing substrate cleaning time and ensuring high yield levels. Furthermore, NSR-1755I7B includes an integrated lot management system that provides a secure, reliable means of tracking wafers and assembly/inspection data. It also features a highly intuitive user interface that simplifies lithography operations and ensures optimal process control. This wafer stepper is designed for both high-volume and high-mix semiconductor production, allowing it to be used in a wide range of applications. NIKON NSR 1755 i7B provides precise direct-write and alignment capabilities for advanced lithography processes. Its high speed and accuracy make it ideal for high-volume production, and its advanced features ensure it is well-suited for complex device patterning. Finally, the machine is also highly reliable and user-friendly, making it a popular choice for lithography institutions around the world.
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