Used NIKON NSR 2005 EX 12B #9316104 for sale

NIKON NSR 2005 EX 12B is a wafer stepper, a machine used to create extremely small components on a semiconductor wafer. The machine uses photolithography, exposing the wafer to light through a mask containing a circuit design in order to produce the desired integrated circuit pattern. NIKON NSR 2005 EX12B features a dual-axis stage equipment, which allows for precise control of wafer placement with an accuracy of 0.4 microns. An additional advanced stage system utilizes planar tracking to ensure that the wafer remains in the same optical plane. NSR 2005 EX 12B can be equipped with a variety of stepper systems such as full field, right-edged, image stitching, and programmable zoom. The full field unit allows for full exposure of the entire wafer surface, while the right-edged machine provides finer control over the exposure's edge. The image stitching tool can be used to overlap several individual exposures into one large shot, while the programmable zoom allows for greater precise control of the exposure near the edge of the wafer. Additionally, NSR 2005 EX12B is equipped with an advanced active alignment asset. The model constantly monitors wafer alignment, allowing for precise control of the exposure parameters. The equipment also employs specialized algorithms for precise edge placement, reducing the margin of error when aligning exposures. In order to ensure high photolithography image quality, NIKON NSR 2005 EX 12B utilizes a high-resolution aberration correction system. The unit compensates for various aberrations—including horizontal flatness, B-state, ellipticity, coma, other distortion, curvature, and field curvature, among others—through an advanced detachable lens machine and an auto-calibration function. Finally, to ensure user safety, NIKON NSR 2005 EX12B incorporates a health monitoring tool. This asset monitors various machine functions, such as temperature, pressure, and vibration, and shuts down the machine if an abnormality is detected. Overall, NSR 2005 EX 12B is an innovative and precise piece of technology, allowing for the manufacturing of intricate integrated circuit structures. Its advanced stage model and active alignment equipment provide the necessary control for precise and accurate exposures, while its aberration correction system and health monitoring unit help to ensure consistent results and safety.