Used NIKON NSR 2005 G8C #9148221 for sale

NIKON NSR 2005 G8C
Manufacturer
NIKON
Model
NSR 2005 G8C
ID: 9148221
Vintage: 1996
Stepper PC missing Type-1 loader Chamber S810 1996 vintage.
NIKON NSR 2005 G8C is a high-precision wafer stepper designed for fast, accurate production of semiconductor devices. This equipment is equipped with a top-of-the-line 5 micron Spot Size Reduction (SSR) objective lens and features a maximum resolution of 12.5nm. Precise automated alignment and motion control, enhanced with an advanced traverse system, provide high yields and low wastage. The G8C also features a large work space with a maximum wafer size of up to 200mm that can handle a wide variety of device structures. The G8C utilizes advanced exposure control algorithms to ensure maximum uniformity and battery approaches. In addition, the exposure unit is enhanced with an autofocus option that allows for precise automatic exposure. The G8C also features a 5-axis stitching feature, allowing you to stitch multiple images to create a single overlay mask. This provides optimal throughput and minimizes wafer handling and costs. The stepper also has an extremely fast wafer processing time, with a throughput rate of up to 600 wafers per hour. The machine also offers low cost-per-exposure and low overall per-wafer throughput, allowing for cost effective operation. The G8C further features an expanded step and repeat capability, allowing you to quickly adjust patterns to fit on the wafer and reduce cycle times. The G8C is designed to be flexible and easy to operate, featuring a wide adjustment range for different substrate sizes and shapes. The tool also offers a wide range of optical configurations, allowing for full lithography flexibility to adjust as technologies evolve. In addition, the G8C is equipped with a digital automation asset that enables quick, easy, and reliable operation. Overall, NSR 2005 G8C is a high-precision wafer stepper designed to provide fast and accurate accuracy in the production of semiconductor devices. It features top-of-the-line optics, an automated exposure control model, an autofocus capability, high throughput rate, flexible lithography, and digital automation equipment. These benefits make it an ideal choice for a wide variety of device applications.
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