Used NIKON NSR 2005 i10 #9243867 for sale

NIKON NSR 2005 i10 wafer stepper is a high-end lithography system used to produce highly precise patterns on thin semiconductor wafers. The i10 is a binary stepper, using two light-beam sources, one for exposure and one for alignment. It is capable of accurately aligning wafers with a minimum of 0.5µm accuracy in the x-y directions, making it ideal for a wide range of lithography tasks. The machine uses advanced optics, software, and mechanics to carry out its precision work. Its optics are composed of a 20-position lens turret with superlong-wavelength lenses and long working distance lenses to ensure a complete imaging field over the entire wafer. The i10 moves its lenses in a wide range of motion to secure the optimal exposure time to produce a precise image. The i10 is equipped with a user-friendly software interface that allows for programmability of lithography processes and quick data access. The software supports connectivity of other digital systems for a greater range of automation and automation-related options. The machine's advanced mechanics ensure accurate and continuous positioning of the wafer on the chuck. It uses a unique air/mechanical bearing system that allows the wafer to float, ensuring the wafer stays in place throughout its exposure time. This allows for a highly precise exposure time and an improved overall yield rate. The i10 also offers a wide range of features such as a smooth-stepping wafer drive mechanism that reduces vibration and tilt errors, a compact-design housing for tight work spaces, and an optional computer-controlled exposure window for high-resolution exposure. This combination makes the i10 an ideal choice for the most exacting lithography applications. In conclusion, NIKON NSR-2005I10 wafer stepper is a high-end lithography system designed for the most precise of lithography applications. It offers advanced optics, software, and mechanics to ensure accuracy and optimal exposure times. Its wide range of features allows it to be used in tight spaces and for a large range of applications. This combination makes the i10 an ideal choice for any lithography task.