Used NIKON NSR 2005 i10C #293591969 for sale

NIKON NSR 2005 i10C
Manufacturer
NIKON
Model
NSR 2005 i10C
ID: 293591969
Vintage: 1955
Stepper 1955 vintage.
NIKON NSR 2005 i10C wafer stepper is a precision alignment equipment designed for the lithography industry. It features the latest in-lens technology and an imaging system that can provide an ultra-high resolution with a large working distance. NIKON NSR 2005I10C is a top of the line model from NIKON JEDM range of steppers. It is extremely powerful and reliable, boasting an enhanced throughput and greater precision. The stepper is equipped with a 10 inch DUV optics unit, a field of view of 14.5mm x 18mm and a working distance of 287mm. This combination of optics, field size and working distance enables the stepper to produce high accuracy with a minimum of aberrations. The stepper features a high-precision mechanical machine with a Y-direction piezo-driven stage and an X-direction automatic stage. The stage movements are accurate to less than one micron and can be used to perform complex lithography tasks. The stepper is equipped with the latest NIKON imaging tool, which includes a 14 megapixel JPEG CCD, a motorized zoom optics asset, an integrated autofocus model, a contrast enhancement equipment and an adjustable diffusion filter. This imaging system provides a resolution of up to two μm and a sampling accuracy of 0.5 μm per square. NSR-2005I10C is designed to be user-friendly and equipped with many advanced automation features. It has an integrated job status monitoring unit, an autofocus calculator and an image processing machine that can reduce aberrations. In addition, the wafer stepper can be equipped with a wide range of accessories like wafer holders, contact image sensors and microscopes, so it can adapt to any kind of lithography application. NSR 2005I10C is a powerful and reliable wafer stepper that has been designed to provide ultra-high resolution images with minimum aberrations and a large working distance. Its high-precision mechanical and optics tool combined with its advanced automation features make it ideal for complex lithography tasks.
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