Used NIKON NSR 2005 i10C #9085273 for sale

NIKON NSR 2005 i10C wafer stepper is a high-precision exposure tool used in semiconductor and photomask fabrication. It combines outstanding performance and resolution with uncompromising standards for accuracy and reliability. This ensures the highest degree of image quality for the wide range of wafer sizes and applications utilized today. NIKON NSR 2005I10C features a turn-table stage utilizing a special high-endurance plastic-coated glass layout designed to achieve minimal stage position instability. The turn-table utilizes an integrated motor drive and a self-aligning motor straddle that allows accuracy as high as +/- 5 µm over the wafer. The wafer can be moved in a range of 400mm × 400mm and the repeatability rate is 0.3µm. The wafer is illuminated with a 1kW halogen lamp, halogen light source and a computer-controlled pulse width-modulated drive. This allows accurately controllable exposure parameters to be used in order to achieve the desired results. Additionally, an advanced cooling system ensures uniform temperature and optimum exposure uniformity, as well as a higher throughput. NSR-2005I10C is equipped with a SynchroScan imaging device, which consists of advanced linear photodiodes and two CCDs. This imaging system allows for a wide range of features and functions, such as automatic critical dimension measurements, stage alignment, TTL alignment, pattern peaking, and multi-field imprinting. All of this can be done with high-resolution and high-accuracy, even when inspecting structures down to 0.4µm or smaller. NIKON NSR-2005 I 10 C wafer stepper also offers several automation and monitoring functions. This helps to reduce manual labor and prevent mistakes. Additionally, the stepper is designed with a dual port output box and remote control capability using a serial I/F or Ethernet. This provides additional flexibility in terms of remote operation, data gathering and control of the various functions of the stepper. Overall, NSR 2005 i10C provides unparalleled precision, flexibility and performance. For maximum image quality, the wafer stepper delivers a wide range of exposure parameters and automation and monitoring functions that help streamline the entire semiconductor fabrication process. As a result, NSR 2005 I 10 C wafer stepper is an indispensible tool for semiconductor and photomask fabrication.