Used NIKON NSR 2005 i10C #9205851 for sale

Manufacturer
NIKON
Model
NSR 2005 i10C
ID: 9205851
Stepper Resolution: 0.45 NA: 0.57 Exposure wave length: i-Line Reduction: 1/5 Expose field: 22 x 22 - 17.9 x 25.2 Alignment accuracy: 0.09 (|x|+3s).
NIKON NSR 2005 i10C is a next-generation, high-performance step-and-scan equipment designed to meet the needs of semiconductor production. This stepper system provides advanced image processing algorithms and high availability. NIKON NSR 2005I10C is a leading-edge wafer stepper that uses the company's proprietary modern deep UV light source to achieve 1.0 nm imaging resolution with excellent processing repeatability. The step-and-scan motion capability of the unit provides customers a more efficient solution for all lithography needs. NSR-2005I10C provides superior performance and reliability, along with a high degree of automation. Its features include a high-resolution image mode for 1.0 nm fabrication and a 10nJ/cm2 low-dose mode for sensitive operations. NSR 2005I10C also features a unique image processing algorithm and an EasyRide intelligent controller, which monitor and adjust the operation based on pattern data and process conditions. The machine is equipped with a number of automation features that can reduce the need for manual intervention while helping with productivity and throughput. NSR 2005 I 10 C offers simultaneous loading of up to 100 wafers, allowing for high-efficiency throughput. The automated inspection tool also provides users with high-speed wafer and feature analysis, allowing them to find and address issues quickly. In addition, the tool features a powerful field-programmable gate array (FPGA) featuring an image sensor that can read and store up to 800 exposures per second. The asset also offers an advanced step-and-scan subsystem, optimized for high-precision alignment. NIKON NSR-2005 I 10 C is a reliable and powerful solution for a range of lithography needs. With its high-resolution imaging and solid automation, customers can be sure of consistent and reliable output. The model's high throughput and advanced image processing algorithms make it easy to manage the production of a wide variety of devices.
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