Used NIKON NSR 2005 i10C #9227509 for sale

NIKON NSR 2005 i10C is a lithography stepper designed for semiconductor manufacturing. It is capable of producing highly detailed patterns in a wide variety of materials, including silicon, gallium arsenide, metal alloys, and other semiconductor and dielectric materials. The i10C utilizes a stepper technology, which allows for repeatable and accurate patterning of complex designs onto substrates. In stepper technology, the pattern is etched onto a wafer or substrate using a beam of ultraviolet light or from an electron or ion beam. In lithography, a beam of light or electrons is directed and focused through a mask onto a substrate or wafer. The light or electrons that pass through the mask are then applied to the wafer and an image is created. The i10C is equipped with a high NA lens and a resolution of 0.091µm, allowing for highly accurate patterning. The system is also equipped with an advanced scanless alignment head to provide very high precision alignment of patterns in three dimensions. It also has a Sub Resolution Assist Feature (SRAF) feature which helps improve accuracy and throughput of sub-resolution components. NIKON NSR 2005I10C is designed with a number of safety features, including an anti-contamination hood, light curtain, and non-contact liquid supply system. In addition, the system has a number of built-in sensors and detectors to monitor the operating conditions of the stepper and its components. The i10C is designed to process up to 200 wafers per hour and is optimized for minimal downtime and maximum utilization. Its advanced features allow for both flexible and consistent processing. The stepper is extremely reliable and capable of producing patterns with edge placements as low as 10nm. In summary, NSR-2005I10C wafer stepper is a highly advanced lithography machine for semiconductor and dielectric materials. It is equipped with a high NA lens and a resolution of 0.091µm, as well as a suite of safety features and advanced features. This machine is capable of producing extremely precise and accurate patterns at speeds of up to 200 wafers per hour and its advanced features provide flexible and reliable processing.