Used NIKON NSR 2005 i10C #9236760 for sale

NIKON NSR 2005 i10C wafer stepper is a high-end instrument used in manufacturing advanced semiconductor products. It is a fully automated step-and-repeat optical microlithography equipment capable of imaging large-size wafers. The system is capable of producing wafer-level optics in a range of sizes of between 6 and 12 inches. NIKON NSR 2005I10C is part of NIKON NSR series of high-end lithography systems. NSR-2005I10C offers top performance and cost efficiency. This unit utilizes alternating dual-field optical imaging technology to generate high exposure uniformity over both field of view, minimizing doze exposure variations over large areas of the wafer at a time. The dual-field optical technology allows for large exposure fields of up to 25 mm in size, giving this machine the capability to image large substrate areas in a single shot. NIKON NSR-2005I10C has a unique exposure unit that is one of the best in its class. The exposure unit is composed of a re-configurable condenser lens, a light shutter, and a wafer chuck with electrode and bezel. The tool utilizes three motorized stages to perform the re-tensioning, aspect ratio, and redirection of the image to the substrate. This exposure unit offers high exposure uniformity, low process variation, and low downtime. NSR-2005 I 10 C also employ a multi-head/multi-beam imaging asset, which is capable of producing multiple exposure fields in one exposure process. The model is capable of producing very small feature size, accurate overlay positions, and excellent imaging quality in a wide range of resist exposure conditions. The equipment has a total accuracy of 1.5 micrometers in the X-, Y-, and Z-axes and is capable of resolutions down to 0.2 micrometers. The system features a dry clean-run capability, eliminating the need for a wet process. NSR 2005 I 10 C is designed to be user-friendly and efficient, offering automatic substrate alignment, automatic exposure optimization, real-time photographic reticle inspection, and curve-fit analysis of multiple ID and aperture settings. The unit also provides a Graphical User Interface (GUI) with multi-lingual support. The GUI allows the user to easily access the machine's professional imaging functions. NSR 2005 i10C is a reliable and powerful wafer stepper machine designed to meet the most demanding optical microlithography applications. It offers top performance and cost efficiency and can produce excellent imaging results in a wide range of resist exposure conditions. The tool features real-time photographic reticle inspection, dry-clean capability, and a user-friendly GUI for easy access to the machine's imaging functions.