Used NIKON NSR 2005 i10C #9239348 for sale

NIKON NSR 2005 i10C
Manufacturer
NIKON
Model
NSR 2005 i10C
ID: 9239348
Stepper, 4" Reticle, 6" 1995 vintage.
NIKON NSR 2005 i10C Wafer Stepper is a precision imaging machine used to create integrated circuits and other semiconductor components. This piece of equipment has been designed to allow for the manufacture of wafers and chips with precision accuracy. It can create die patterns, contact holes, vias, and other circuit geometries on each layer of a wafer. NIKON NSR 2005I10C has a beam spot size of 5 um and a numerical aperture of 0.47. It is equipped with a 10-inch F2.5 optical equipment and a 0.75X reduction lens, which gives it a superior image quality. It also has a DUV (deep ultraviolet) source, an Mx860 beam position controller, and various other next-generation components, making it one of the most advanced wafer steppers on the market. The stepper is capable of achieving resolutions of up to 0.08 microns while still maintaining superior overlay control. It is also able to handle a wide range of power levels, up to 10 watts, and can handle exposure times of up to 45 seconds. Furthermore, the machinery is designed to work with a range of substrates, including silicon, quartz, and glass. In order to ensure that the wafer is properly processed and etched properly, NSR-2005I10C also features a variety of sensors and alignment systems to help accurately align the wafer. It contains a 3D alignment system, a pattern centering unit, a micro-bundle alignment machine, and a die selection tool. Furthermore, an air bearing table is used to ensure that the wafer is handled delicately during the imaging process. NIKON NSR-2005I10C is designed to operate with efficiency and accuracy, allowing for the production of high-quality images with minimal defects. It is able to work with a wide range of substrates, allowing for more versatility when it comes to creating integrated circuits. Furthermore, its precision imaging capabilities come together to produce superior results with minimal effort.
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