Used NIKON NSR 2005 i10C #9378020 for sale

NIKON NSR 2005 i10C is a wafer stepper and is a computer controlled machine used to produce integrated circuits (IC) photomask patterns onto the surface of a wafer. This type of stepper uses a high-resolution image projection to accurately transfer a mask pattern onto the wafer. NIKON NSR 2005I10C equipment is designed to transfer a single-layer mask onto the wafer using a laser scanning projection system. It is capable of delivering high-precision and high speed photomask patterns onto a wafer. The scanner uses a laser that is focused through a rotating aperture onto the wafer. The scanner has both fast scanning and step-and-repeat alignment capability. The projetion unit is designed to provide a high level of alignment accuracy and keep registration errors "at the nanometer level". NSR-2005I10C is composed of a number of components that work together to provide high levels of accuracy and performance. This wafer stepper includes a pattern generator, a photomask, a reticle stage, a four-axis reflex module, an image sensor, and an object lens. The pattern generator is responsible for producing the pattern that will be projected onto the wafer. The photomask is a lithographic template that contains the pattern that will be printed onto the wafer. The reticle stage is an automated platform that holds the photomask and moves the photomask into the correct position for the laser to scan it. The four-axis reflex module is a control device that is designed to measure and adjust the four degrees of freedom (X, Y, Θx, Θy) of the wafer. The image sensor is attached to the object lens and is used to capture the image projected onto the wafer. The object lens is responsible for focusing the laser projection machine onto the wafer. NIKON NSR-2005I10C tool is designed to deliver high-precision and high-speed photo masks onto the wafer. It is capable of transferring high-resolution patterns with very low levels of registration errors. It is also capable of providing fast scanning and step-and-repeat alignment capabilities. As well, this wafer stepper includes a number of features such as an integrated Auto Exposure Adjustment Asset, a high level of alignment accuracy, and a pattern generation toolbox. Overall, NIKON NSR-2005 I 10 C wafer stepper is a computer controlled machine that is used to produce integrated circuits photomask patterns onto the surface of a wafer. It is designed to deliver high-precision and high-speed photo masks onto the wafer and includes a number of features that provide a high level of accuracy and performance.