Used NIKON NSR 2005 i10C #9389865 for sale

NIKON NSR 2005 i10C
Manufacturer
NIKON
Model
NSR 2005 i10C
ID: 9389865
Stepper.
NIKON NSR 2005 i10C Wafer Stepper is a versatile and high-performance semiconductor device fabrication tool. It is designed for cost-effectively performing high-resolution lithography processes of up to 0.25 μm. This equipment offers advanced equipment features, such as high-precision sample motion; high stability against environmental vibrations; and autofocus, which aids in sample alignment. The wafer stepper combines high-resolution optical projection with a broad process range including optical proximity correction (OPC). This makes it ideal for the demanding requirements of fine-line VLSI production and nano-scale device fabrication. The wafer stepper is configured with two laser interferometers, two stages, a dual-layer lithography head, and a heated loadlock. The dual-layer lithography head is capable of high-resolution 0.15 μm exposure, and is capable of accommodating several exposure fields in one exposure. The heated loadlock eliminates the need for long-term mechanical stability, enabling the production of high-quality patterns in short exposure times. The wafer stepper is equipped with a number of features to help ensure greater stability, such as an airbearing stage, audioscopic noise level monitoring, temperature and pressure control, and vibration suppression systems. The airbearing stage accurately positions the sample to achieve maximum accuracy and stability. The audioscopic system monitors the noise level of the machine, and when an abnormal sound is detected, the unit will immediately alert the operator. In addition, the machine offers excellent exposure and overlay capabilities. The exposure feature offers superior image quality with high resolution and contrast, while the overlay feature offers precise pattern alignment, achieving high process accuracy with minimally toleranced components. The wafer stepper is an excellent choice for the production of high-precision patterns in short exposure times. It offers superior resolution and accuracy, and is capable of high levels of productivity in terms of throughput and yield. The tool is safe and versatile, and can be customized to suit various processes and applications.
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