Used NIKON NSR 2005 i10C #9408445 for sale

NIKON NSR 2005 i10C is a highly advanced wafer stepper employed in the field of semiconductor lithography. This stepper includes both scanning and an alignment equipment, allowing manufacturers to precisely pattern the desired product onto multiple chips. To ensure high-precision operation and guarantee reliable product yield, the system is equipped with auto-alignment and defect review which further guarantee the production yield of inferior products. NIKON NSR 2005I10C is a full-field, step-and-scan unit that delivers high-precision lithography results. The machine can pattern smallest feature sizes of up to 0.25 micrometers, thanks to its advanced optical technology with numerical apertures (NA) of 0.68, 0.9 and 0.78 respectively. Moreover, its sophisticated scan and alignment tool enables it to reliably align the wafer to the reticle and scan small defect areas. This asset is equipped with a lithography head for exposure control and provides a wide range of exposure options for production. NSR-2005I10C is also outfitted with its own single-wafer stage with 8-axis motor drive, dynamic accuracy control, fully automated tool algorithms and automatic exposure control. Through its automated calibration model, the stepper can measure molecules and wafer deformations which allow users to accurately adjust exposure time and illumination more accurately. This allows reliable and accurate exposure of features on chips, thus improving production accuracy and yield. Moreover, the equipment features high-speed scanning of up to 6 inches/second, allowing manufacturers to produce multiple chips in a single step. Its field-of-view (FOV) is larger than most conventional models, allowing greater coverage and scanning times. Furthermore, its tandem scanning and alignment capability also enables manufacturers to accurately stitch patterns across multiple chips, enabling high-yield production. Overall, NIKON NSR 2005 I 10 C is a precision wafer stepper that provides superior accuracy and reliable performance for the production of high-specification semiconductor chips. Its superior optics, advanced scanning and alignment system, single-wafer stage, FOV and automation capabilities offer a wide range of exposure and lithography options and ensure consistent production results.