Used NIKON NSR 2005 i11D #293813221 for sale

NIKON NSR 2005 i11D is a state-of-the-art wafer stepper designed to quickly and accurately produce photomasks for semiconductor production. The advanced wafer stepper features a very large stage with a travel distance of 800 x 900 mm. It is equipped with two independently controlled stages for double-sided alignment and improved accuracy. With multiple metrology and alignment options, NIKON NSR-2005I11D can precisely and exactly reproduce patterns from even the most complex mask designs. The advanced laser and optics systems of NSR 2005 I 11 D are perfect for high-precision applications. The step and repeat lithography equipment uses a state-of-the-art ultra-stable optical platform while a wide variety of illumination mode options makes it very adaptable to different wafer sizes. The laser-based mechanisms have been designed and optimized for top performance, providing a resolution up to 0.3 microns with highly accurate placement accuracy. Furthermore, NIKON NSR 2005 I 11 D features an innovative AutoAligner, perfect for maintaining the highest accuracy and alignment during production of multiple layers. The system also supports very large fields of view with a maximum field of 28mm x 28mm and a minimum field of 3mm x 3mm. The image sensor has high sensitivity, making it the perfect choice for low-k1 applications. The advanced control unit of NSR-2005I11D further optimizes lithography performance. It comes with a total of four individual dose controllers that can be used to adjust the exposure dose to each pattern individually. Additionally, the machine supports a wide choice of exposure filters and auto-adjustment of the dose tool for easy optimization of lithography needs. Its advanced design makes it a perfect asset for high-efficiency photolithography. NSR 2005 i11D is an ideal solution for a range of industries requiring high-precision, high-yield photomasking solutions. With its advanced design, reliable operation and easily adjustable exposure settings, it is the perfect choice for a range of complex, low-k1 photomask applications.