Used NIKON NSR 2005 i14E #9316105 for sale

NIKON NSR 2005 i14E is a production-class photolithography wafer stepper designed for fabricating advanced integrated circuits. It features an automated alignment equipment which is precise to within 1 micron, allowing for extremely precise patterning of the wafer. The system features an advanced two-beam optical design, ensuring photoresist uniformity across the entire substrate. This ensures that areas of the wafer are able to hold the same amount of exposure and the desired pattern is accurately and uniformly replicated. NIKON NSR 2005I14E is compatible with a wide range of exposure wavelength, enabling the operator to select the appropriate wavelength for the particular project at hand. The unit is capable of accommodating a variety of lens types, allowing for the user to select the most suitable lens for their specific task. It also features an automated, advanced machine for levelling the mask stage, maximizing the accuracy and repeatability of the patterning process. The tool is further equipped with a calibration asset to ensure excellent resolution. This model adjusts the stage position and lens movement according to the substrate type that is being processed, ensuring maximum precision. The process is also monitored through a high resolution monitor, allowing the operator to view and adjust the equipment's settings and parameter in real-time. NSR 2005 i14E is also outfitted with a variety of safety features, including dust protection, unauthorised use prevention, and power auto-off. It also features powerful process diagnostics, enabling the operator to troubleshoot potential problems and ensure optimal performance. NSR 2005I14E is an innovative wafer stepper that is equipped with a range of advanced features, ensuring maximum precision and safety in the lithography process. Its automated alignment system and dust protection feature make it a reliable and efficient machine for advanced integrated circuit fabrication. Its impressive set of features and diagnostic capabilities make it an invaluable tool in a photolithographic facility.