Used NIKON NSR 2005 i6 #293652747 for sale

NIKON NSR 2005 i6 is a wafer stepper designed to handle high-volume and high-mix production. It offers exceptional throughput performance, offering 4- to 6-inch substrate sizes at speeds up to 2.5 times faster than comparable NIKON systems. The equipment features an "intelligent exposure" computer control system that automatically adjusts illumination and exposure time to achieve optimal results on any type of resist. NSR 2005 i6 is available with a high performance dual exposure head that can quickly process complex wafer patterns. The exposure head employs a combination of halogen and mercury lamps to minimize ultraviolet exposure and minimize resist pattern variations due to exposure time and intensity. The exposure head uses a high-resolution quarter micron reticle and precision high magnification projection optics to ensure a high-resolution image and uniformity. The exposure head has a tunable light intensity and can quickly adapt to different size and types of photoresists. The optics are built for very low distortion levels, eliminating image distortion and making the unit extremely accurate for advanced lithography applications. NIKON NSR 2005 i6 is a repeatable, unsurpassed precision stepper with one of the most advanced optical systems available. The machine offers very low alignment error levels and can quickly accommodate substrates of different sizes and resists. The tool is designed to provide high throughput and excellent uniformity, even in high mix production environments. Finally, NSR 2005 i6 is equipped with a high-performance controller capable of handling any type of algorithm. It can easily program coordinates and exposure times, and includes features such as auto-focus, edge and center determination, and general programmable logic. This can free up operators to focus on more complex tasks while providing high throughput and uniformity.