Used NIKON NSR 2005 i8A #9016445 for sale

Name: NIKON NSR 2005 i8A
Brand: NIKON
SKU: 9016445
Availability: SoldOut

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Wafer Steppers

Manufacturer

NIKON

Model

NSR 2005 i8A

ID: 9016445

Wafer Size: 6"

Vintage: 1991

i-Line stepper, 6" Wafer stage results of last PM: Wafer holder flatness (Spec. < 2.5 μm): 1.3 μm (no leveling) Y mirror travel (Spec. < 5 μm): -0.7 μm Orthogonality (Spec. ≤ 0.96 μrad): 0.2 μrad Stepping (Spec. 3σ≤ 70 nm): 3σ X: 27 nm, 3σ Y: 27 nm Back-step (Spec. 3σ≤ 70 nm): 3σ X: 45 nm, 3σ Y: 36 nm Illumination system results of last PM: Lamp power: 447 mW/cm² Uniformity (overall ≤ 1,5 %): 1.26 % Actual vs. displayed power (≤±5 %): -3,712 % Illumination tele-centricity (Spec. ±1 μm Z < 40 nm): Xmax/min: 38/-17 nm Ymax/min: 6/-32 nm Lens results of last PM: Lens inclination (Spec. Tilt ≤±0.2 μm) UR-LL: 0.030 μm UL-LR: 0.069 μm Distortion (Spec. ≤±70 nm) X max/min: 19/-32 nm Y max/min: 47/-24 nm Chamber: Chamber front chamber temp: 23 ± 0.1 °C, 23.01 Pressure supply: 3 ± 0.1 Kg/cm², 3.1 Vac supply: > 460 mmHg, 650.00 Freeezer pressure: High pressure: 15 ± 1 Kg/cm², 15.0 Low pressure: 4.85 ± 0.65 Kg/cm², 4.40 Wafer stage: Clean and grease leadscrew X: OK, Y: OK Clean and lubricate needle bearing X: OK, Y: OK Perform stage running ca 10 min only after stage PM: OK Check Interferometer mirrorsl X: OK, Y: OK Check fiducial: OK Wafer holder flatness (no leveling): 6" < 2,5 µm, max-min mm 2.2 Orthogonality: to customer wafer ≤ 0.5 µrad, Wafer_ORT= µrad 0.3 Stepping STEP spec: 3 sigma ≤ 70 nm, stepping 3 sigma X = nm 36 3 sigma Y = 27 nm BACK spec: 3 sigma ≤ 70 nm, backstep 3 sigma X = 51 nm 3 sigma Y = 42 nm Nikon i8 body: Sr6c 5ib2 Sr lens 5ib2 Sr6b standard control rack Sr6 accessory part 1 Sr6b lia Sr6b lc 2 Sr6c iu 5ib2 Sr6c 5ib2 fe 5 Sr6c ws 8 Sr6 ceramic wh 5-8 Sr6c arl 56 Straight arm 5 Sr6c library adapter 5p 56 Sr6c wl 6 8 Sr6c wl extra carrier 68 Sr6c wa Sr6c fia Sr6c lia attachment part Sr6c reticle table 5 6 Sr6c interferometer Sr6c vacuum control Sr6c pedestal Sr6c avis Sr6c control unit Sr6c chamber s Sr6c chamber panel 5 6 Sr6 lsa measurement software ver2.2 Sr6c ra 2 4 axis cameras mechanism 5 Sr6c aircondition 1b nema Sr6 wl safety Sr6b hg trap metal mesh Sr6b rack modification us Sr6 hg lamp outlet Sr6c export tool Sr6c laser safety part usa Sr6c machine label Sr6c safety label usa Sr6c chamber label usa Sr6c/8 high reflection board attachment parts Sr 5ib2/c2 relay lens Sr6 wafer cassette positioner if Sr6c fia step 1 Sr6b/6c glass filter u-360 Sr6c extension cable protection cover Sr6c ra2 cover for 4 axis camera Sr6b hg lamp power supply ib2 Sr6c hg lamp power supply change ib5 Sr6c export mod ibm 973 Disassembled and crated 1991 vintage.

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NIKON NSR 2005 i8A is a wafer stepper designed specifically for wafer level processing with integrated high throughput and high accuracy. The unit is capable of accommodating substrates up to 200 mm in diameter, allowing for a larger area than most conventional stepper systems. The precision optics equipment provides a high degree of accuracy and repeatability, allowing for a foundation of repeatable processes. Additionally, the integrated motion control and autofocus help minimize cycle time for improved throughput. The advanced alignment system of the unit features both coarse and fine alignment capabilities with a high level of accuracy and speed. The unit uses below field optics and high-resolution CCD cameras to precisely detect the exact position of each wafer after alignment. Further, the focus and alignment functions can be customized as needed to address specific substrate-level applications. The machine's illumination feature is highly customizable with a choice of wavelengths, numerical apertures and uniformity levels. This feature is essential for optimizing lithography results and ensuring the highest-quality images. Additionally, the unit integrates highly sensitive laser sensors and laser interferometry to measure the exact positions of each wafer, decreasing process variability and potential for errors. Additionally, the unit offers a large range of overlay compensation abilities and a variety of pattern recognition functions. This ensures that each wafer is accurately placed in the stepper without costly errors or rework, saving time and reducing costs. Further, a fully-automated main-load handling facility is available for hassle-free substrate loading, unloading, and changing. NIKON NSR 2005I8A comes equipped with a powerful, easy-to-use NIAS control interface that allows for complete process control. The intuitive graphical user interface allows for efficient process design, which increases throughput and helps reduce downtime. Additionally, the unit meets UL, CE, and FCC standards, meeting tightening safety and environmental regulations. Overall, NSR-2005I8A is a powerful and accurate wafer stepper designed specifically for medium- to high-volume wafer level processes. The unit features integrated high-precision optics, a highly customizable illumination tool, and automated main-load handling, allowing users to achieve fast, repeatable, and reliable results.