Used NIKON NSR 2005 i8A #9159993 for sale

NIKON NSR 2005 i8A is a submicron, slit-type wafer stepper that was developed by NIKON Precision Inc. in 2005. The stepper is based on the company's proprietary field lens immersible technology, which has been optimized to support a wide range of applications including miniaturized semiconductor and nanofabrication processes. NIKON NSR 2005I8A is equipped with two sets of lenses that work together to magnify the image or pattern and reduce aberrations. The first set is comprised of field lenses which are non-beam-splitting and designed to provide a flat wavefront for imaging. These lenses also minimize the inner-field curvature, enabling uniform and high-resolution imaging. The second set is comprised of secondary lenses which use reflection mirrors to correctly focus the light from the field lenses at the exposure stage. The stepper is also equipped with a VCM (Variable Center of Mass) system which enables fast and highly accurate adjustments of exposure energy and focus position, allowing accurate exposure of submicron features. Furthermore, NSR-2005I8A has a built-in exposure control system that accurately regulates the light pattern, ensuring high uniformity and repeatability of exposure energy. NSR 2005I8A also features a unique stage design. The Stepper uses a dual stage configuration which allows for fast and precise positioning within a wafer plane. This enables faster throughput and higher accuracy within the exposure cycle. Furthermore, the stepper is equipped with vacuum chucks for reliable wafer clamping and temperature controllers for uniform wafer temperature. Overall, NSR 2005 i8A is a reliable and high-performance wafer stepper that is suitable for a wide range of applications in semiconductor and nanofabrication processes. The stepper's dual-stage design, field lens immersible technology and exposure control system enable accurate and uniform exposure of submicron features.