Used NIKON NSR 2005 i8A #9226275 for sale

NIKON NSR 2005 i8A Wafer Stepper is an advanced lithography machine incorporating a step-and-repeat alignment equipment. This system allows for precise positioning of specimens for imaging and/or processing. The machine's capabilities make it ideal for a range of applications including photomask and reticle imaging, mask aligner for single-mask overlay, and alignment for MEMS and MOEMS processing. NIKON NSR 2005I8A is capable of precise sample positioning and photomask imaging that facilitate even the most precise challenging applications. NSR-2005I8A is a fully automated stepper-scanner that features a user-friendly console, allowing users to easily set up and manage the unit. The machine comes with two automated movable-stage orienters, a distributed lithography module, and a precise measuring device. Its high-end optics tool delivers superior resolution, with image fields spanning up to 300mm with a working distance of 7nm to 5mm. The asset can also accommodate short- and long-run exposures, as well as pulsed and continuous exposure. NSR 2005 i8A utilizes an 8" vision-controlled scanning platform which allows for the easy alignment and orientation of photomask and reticles, as well as positioning and alignment of all specimen types and wafers, allowing for high-precision image acquisition. The platform also includes optical interferometry, long depth-of-focus, and calibration accuracy to sub-micron level translations. This, combined with the model's automated overlay-alignment feature, makes it ideal for MEMS and MOEMS processing. NIKON NSR 2005 I 8 A is equipped with fabrication-compatible control, allowing users to change parameters without interrupting the production process. This feature is especially useful for rapid process optimization, saving time and money. The machine also features multiple-exposure capability and automatic lens changer, enabling users to switch between optics quickly and easily while ensuring uniform exposures. In conclusion, NIKON NSR-2005 I8A Wafer Stepper is an advanced lithography machine incorporating a step-and-repeat alignment equipment. It provides superior resolution, optical interferometry and calibration accuracy to sub-micron levels, combined with the user-friendly design and fabrication-compatible control, make it an ideal choice for photomask and reticle imaging, mask aligner for single-mask overlay, and MEMS/MOEMS processing.