Used NIKON NSR 2005 i8A #9248587 for sale

NIKON NSR 2005 i8A is a wafer stepper, which is an automated stepper used for printing micro-electronic circuits and structures onto substrates, such as wafers, die, PCBs. It is mainly used in the semiconductor industry to fabricate integrated circuits, circuit boards, and other electronic components. This stepper offers superior accuracy and flexibility to provide high-precision exposure of substrates with even the most intricate designs. It has a high-performance optical equipment, enhanced by NIKON exclusive SICM (Specular Intensity Controlled Measurement) technology, that optimizes exposure uniformity and alignment across the wafer. NIKON NSR 2005I8A provides high-speed imaging exposure with a high throughput capability of up to 7200w/hr. The system can accommodate up to six exposure heads and five alignment systems, depending on the configuration, which automatically adjusts to fit a wide range of wafer sizes, from 2" to 12". It also features an automated substrate handling unit for easy loading and unloading. In addition, the machine has multiple resolution settings, providing precision imaging across a variety of device structures. The wafer stepper features a smaller, lighter CCD with a wide photosensitive area to provide high-speed exposure and continuous focusing over a large area. In addition, the stepper has an advanced Fan-Out Control Tool, which adjusts exposure to fit the target design, reducing unwanted exposure and eliminating any aberrations associated with larger, multi-projection systems. NSR-2005I8A wafer stepper also incorporates an advanced design verification asset, which performs real-time image comparison between the designed pattern and the wafer pattern. This ensures accurate printing of the designed structure and eliminates any potential errors. Finally, the model has various data output options, allowing for easy reporting and analysis of the final results. NIKON NSR-2005 I8A is a reliable and efficient wafer stepper, bringing increased flexibility and precision to a wide range of semiconductor fabrication processes. Its advanced design and high-precision imaging capabilities guarantee superior results for the fabrication of the most challenging designs.