Used NIKON NSR 2005 i8A #9250072 for sale

NIKON NSR 2005 i8A wafer stepper is a key piece of equipment required for advanced lithographic processes in semiconductor manufacturing. It is a highly accurate machine capable of producing extremely small features on thin substrates. NIKON NSR 2005I8A consists of a mainframe, aligner stages, a projection optics equipment and an exposure source. The mainframe is composed of a vacuum-tight chamber, feed and staging arms, and motorized positioning stages. The vacuum tight chamber protects the stage from exposure to airborne contamination which can affect the accuracy and device yield of the exposure process. Inside the chamber is the Exposure Source, composed of one of two illumination sources, ozone or deep ultraviolet. The choice of exposure source will depend on the type of exposure mask used. For example, deep ultraviolet is used when exposure masks made of quartz are employed. The Projection Optics System of NSR-2005I8A consists of a series of lenses and mirrors which provide the necessary magnification and focusing parameters for the desired device layer. The optics are optimized to provide the highest resolution levels and feature sizes achievable. The Aligner Stages of NSR-2005 I8A use precision encoders and servo motors to direct the stages in X, Y and θ plane. These stage corrections are essential for keeping die-to-die placement accuracy and critical features in alignment. NSR 2005I8A is designed to improve device yields and device tolerance by providing the highest level of repeatability and accuracy. Its features include high-resolution imaging, efficient throughput and an advanced process control unit for maintaining a stable environment for sensitive exposure processes. With its automated vision alignment machine, the stepper can detect and correct for misalignments as well as monitor substrate uniformity to ensure the highest quality parts are produced every time. Overall, NSR 2005 I 8 A wafer stepper is an invaluable piece of advanced lithography equipment offering high speed, accuracy and repeatability to the semiconductor industry. This advanced tool is capable of creating the most sophisticated patterns on extremely thin, delicate substrates that would otherwise be impossible to produce with traditional methods.