Used NIKON NSR 2005 i9C #9003511 for sale

NIKON NSR 2005 i9C Wafer Stepper is a highly versatile and accurate wafer lithography equipment for producing semiconductor circuits and components. The machine is capable of producing advanced device structures with line/space pattern resolutions of 22nm and can cover an area of 8 inches in a single shot. NIKON NSR2005I9C Wafer Stepper is powered by the latest high-precision image-projection optics, offering superior resolution and focus accuracy compared to conventional lithography systems. The system is composed of three main units: the main control unit, the wafer stepper, and the light sources. The main control unit contains all the necessary software and hardware components to control and process the image and data of the wafer. The components include a controller, a computer, a monitor and a networking device. The wafer stepper unit contains the motors and optoelectronics needed to accurately relocate wafers within the unit and accurately position them for lithography. It also includes a stage table and a controller board for controlling the orientation of the wafer and the optics. The light sources provide the necessary optical radiation for producing images on the surface of the wafer. NSR-2005I9C Wafer Stepper is equipped with an intuitive user interface that includes: a user-friendly graphical user interface (GUI) for controlling the machine as well as an advanced particle imaging database for storing, managing and controlling the wafer data. The GUI can also be used for manual editing and injection of imaging data into the lithography tool. NSR 2005-I9C Wafer Stepper is designed with a highly accurate and stable wafer stage that is capable of providing smooth, reliable and precise performance throughout the entire lithography process. The asset also contains an advanced optical model built with high-end optics, providing superior image quality. Furthermore, NSR 2005 i9C Wafer Stepper is equipped with a high precision alignment equipment to accurately locate the substrate, align the mask and locate the pattern on the wafer. This means that the system can precisely locate the edge or corner of the mask even at a distance of less than 5 micron. It also feature a high-speed drive mechanism capable of providing rapid operation and high-precision control of wafer motion with no need of expensive calibration. Finally, NSR 2005I9C Wafer Stepper is designed with heated chambers and advanced temperature control systems, allowing precise temperature setting and stabilization inside the stepper. This ensures that environmental and acceleration factors are minimized, thereby optimizing the quality of the semiconductor device production run.