Used NIKON NSR 2005 i9C #9096010 for sale

NIKON NSR 2005 i9C is a high-speed and high-precision wafer stepper designed for a wide range of advanced photomask patterning applications. It is a semi-automated equipment offering excellent versatile system configurations. The wafer stepper has several advantages over other equipments in terms of working precision and speed. The feature set of NIKON NSR2005I9C includes an optical pre-alignment unit (OPS) with a support capacity of up to 22.0" and an air bearing x/y/theta stage with a fast settling time and a minimum incremental jitter of 5 microns. This high accuracy can be achieved thanks to the combination of precision optics and high-tech mechatronics. The overall performance of NSR-2005I9C is enhanced by its advanced imaging machine designed to maximize the exposure uniformity and field size. It features a fast and highly accurate multiple exposure mode that significantly improves the tool throughput. Moreover, the wafer stepper has a fully integrated software asset that allows for sequential, simultaneous and mixed exposure and etching. The model is also equipped with several safety systems that protect the environment and the equipment from any damage and failure. The array of safety systems includes gas purification, dust prevention, air filter, and high-pressure differential scrubber. NSR 2005I9C can also be used in ultra-high vacuum applications due to its superior vacuum capabilities. The ultra-high vacuum regime is improved by the application of the integrated ultra-high vacuum (UHV) equipment with an ultra-low outgassing profiles for the highest performance. The wafer stepper can be connected to a host or remote machine for extra flexibility and ease of operation. The integrated remote operating software provides complete control of the system through a browser interface. The wafer stepper can also be integrated with other production tools such as waybills and databases. In conclusion, NSR2005I9C is an advanced multi-functional unit designed to meet the demands of the photomask patterning applications. It is equipped with high precision optics and mechatronics, an advanced imaging machine, a variety of safety systems, and ultra-high vacuum capabilities to provide excellent tool performance. Furthermore, the wafer stepper can be connected to a host or remote machine for extra flexibility and ease of operation.