Used NIKON NSR 2005 i9C #9096011 for sale

NIKON NSR 2005 i9C is an advanced wafer stepper equipment that features impressive speed, accuracy, and precision. This stepper system is designed to help its users produce exacting photolithographic images on semiconductor substrates. To start, NIKON NSR2005I9C has a 5-axis motion control module for ultra-precise motions along the X, Y, and Z axes, as well as rotation and a third-axis tilt. These movements provide optimal accuracy and allow for quick substrate alignment. The unit also boasts a high-speed CCD image sensing device, providing full-frame EDWS (edge detection and wafer scan) at high resolution. This allows precise edge recognition and wafer analysis, while also scanning the entire substrate at once to ensure high accuracy. NSR-2005I9C utilizes a variety of special lenses to ensure high-accurate positioning of the exposure field. It also uses a high-resolution motion control machine to achieve ultra-precise motions on the X, Y, and Z axes, enabling precise positional control. This stepper tool is also equipped with a Chuck Shutter Mechanism (CMS) for precise shutter control, eliminating any tilt variation that can lead to inaccurate distances from light sources. NIKON NSR 2005I9C is also capable of advanced stabilization techniques such as Active Layer Stabilization (ALS) for ultra-precise exposure magnification control and Layer-by-Layer Fixing (LBLF) for precise layer boundary positioning. This asset also uses AMRC technology to remove the need for manual alignment, greatly simplifying the process of creating accurate photolithographic images. NSR 2005 i9C also features a Multi-Point Loading model, which can be used to load multiple wafers at once, increasing throughput and reducing waiting times. Additionally, it also offers options such as Automatic Beam Shutter, Low Pressure/Low Temperature Exposure (LLTE), and Heating Stage Door (HSD), providing additional flexibility and performance. Overall, NSR2005I9C wafer stepper equipment is an impressive device that is capable of providing extremely accurate, precise, and fast photolithographic images. Its 5-axis motion control module and high-resolution motion control system ensure ultra-accurate exposure magnifications, layer positioning, and shutter control, while its AMRC technology, Multi-Point Loading unit, and additional options provide further flexibility and improve throughput.