Used NIKON NSR 2005 i9C #9239576 for sale

NIKON NSR 2005 i9C wafer stepper is a highly advanced and automated wafer processing equipment designed to increase accuracy and production efficiency in semiconductor device development. It offers precise alignment and rotation controls with two independent, controlled axes of motion, allowing for the precise etching of intricate patterns on the wafer surface. Additionally, the stepper has a built-in programming interface, allowing for easy setup and operation for even the most complex device designs. NIKON NSR2005I9C has a highly efficient and powerful lithography system. Its advanced optics, comprised of three spherical lenses, provides fine focus control and uniform exposure coverage. It also facilitates a shot-sharing algorithm to optimize exposure of each photo pattern, resulting in improved production yield. This stepper also offers a maximum alignment resolution of less than 0.3 nm, ensuring extremely high precision performance. The special shutter unit allows for an even exposure across the entire wafer, reducing the complexity of manual exposure compensation. NSR-2005I9C has a robust design, made to endure repeatable, high-accuracy processing operations. Its resonant scanner and compact base prevents micro-vibrations during operations and its built-in thermal compensation compensates for any thermal drift that might occur. Additionally, the stepper provides a secure handling mechanism for safe loading and unloading of wafers from the wafer stage. The high throughput stepper provides a speed of up to 30 wafers per hour and its Overall Equipment Efficiency (OEE) is greater than 90%. It features a factory automation solution for integration with potential peripheral device, enabling automated maintenance. The built-in lithography process monitor helps in detecting process variation as early as possible and its algorithmic-based library provides an efficient calibration machine. NSR 2005-I9C is an industry-leading wafer stepper that offers an impressive level of accuracy and productivity. Its advanced lithography tool and thermal compensation provide a surefire platform for creating high-quality and intricate devices, making it perfect for semiconductor device development. Furthermore, its USB data framework and easy setup interface allow for quick and easy operation, and its OEE ensures high yield results.