Used NIKON NSR 204B #293594810 for sale

NIKON NSR 204B Wafer Stepper is a powerful and reliable photolithography equipment used in a variety of diverse industries. This device is designed to consistently and accurately print and etch microscopic patterns onto wafers in order to produce circuit chips and other microelectronic components. NIKON NSR-204B is an all-in-one solution for production of high-tech components. It features a unique high-precision orthogonality x-y-t stage that is capable of accurately aligning the patterns onto the surface of the wafers. An integrated computer-controlled autofocus system makes sure that the pattern is perfectly printed with precisely controlled line and space widths. Additionally, NSR 204B has a large working area, allowing for a large number of precise printing and etching processes to take place on the wafers. NSR-204B also features a good level of plasma-flush for better quality of patterns. This method uses a large volume of reactive circulating gas to react with the patterns on the surface of the wafer and form a protective film. It significantly improves the resolution, registration, and attainable line and space widths of the ultra-small devices while ensuring precise wafer alignment. NIKON NSR 204B is a modular unit that is capable of being configured for a variety of user applications. It can be customised with a selection of optical and exposure systems so that it can be best adapted to the end user's needs. The machine comes with a long-life illumination lamp that can extend its life up to 200,000 working hours. NIKON NSR-204B is also exceptionally easy to use and maintain. It is designed with a simple user-friendly graphical user interface that is easy to navigate. An integrated monitoring tool allows the user to check on the status of the machine at any time. Additionally, periodic maintenance and service requirements can be scheduled and performed with ease. NSR 204B is a high-quality and reliable wafer stepper that is easy to use and maintain. Its advanced optics and integrated auto-focus asset can ensure precise and accurate printing and etching of extreme densities. It is well suited for a variety of industrial applications and provides users with a cost-effective and reliable solution for their photolithography needs.