Used NIKON NSR 2205 EX12B #9251032 for sale
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ID: 9251032
Stepper
Resolution: 280 nm
TEL / TOKYO ELECTRON Mark 8 Coater / Developer system included
Inline left
Wafer specification: Φ8 Orientation flat
Wafer chuck: NIKON Genuine holder
Reticle specification: NIKON Cassette, 6"
PPD
CYMER ELS-5410 Laser.
NIKON NSR 2205 EX12B wafer stepper is an advanced tool for semiconductor lithography. This tool is renowned for its high precision and reliable imaging performance. It is a highly reliable machine ideal for large scale production in the semiconductor industry which requires quick yet high repeatable results. It consists of two components; the main unit which houses the optics and an exchangeable optical column. The main unit boasts a number of high end features such as an ambient temperature range of 16-30C with a humidity range of 15- 80%. The cabinet also features auto cleaning with a built-in motorised laminar flow purification equipment and a cooling system. In addition to this, the main unit has a dimension of 804x1110x1579mm and weighs in at approximately 990kg. The exchangeable optical column features a power zoom unit and offers high resolution imaging, making it an ideal choice for advanced chip fabrications. It utilises an electron multiplier mass spectrometer technology which enables the user to measure doses accurately. The column is equipped with a solid field lens machine which produces images with superior uniformity, resulting in improved exposure uniformity. The column also includes a vibration isolation tool to reduce vibration interference. Moreover, NIKON NSR-2205EX12B offers a wide variety of alignment capabilities such as a wide field-of-view imaging and automatic lens alignment asset. It also has sophisticated imaging capabilities such as variable exposure times, variable exposure resolution, variable exposure speed and variable exposure dose. The exposure light source can be selected from either a narrowband HE or Xe excimer laser. In conclusion, NSR-2205 EX12B is an excellent choice for advanced chip fabrications requiring precise, high repeatability and reliable results. With its high end features, exposure capabilities and advanced alignment systems, it is perfectly suited for large-scale production applications.
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