Used NIKON NSR 2205 EX12B #9265226 for sale
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ID: 9265226
Vintage: 1997
DUV Stepper
Resolution: 280 nm
N.A: 0.55
Exposure light source KrF: Excimer laser (248 nm)
Reduction ratio: 1:5
Exposure field: 22 mm Square to 17.9 mm (H) x 25.2 mm (V)
Alignment accuracy (EGA): 55 nm
Robot arm, P/N: DDCVR-CR1041
Laser head
Alignment systems:
LSA
FIA
CYMER ELS5400 Laser
Lens type: 5EB2
LSA / FIA
Table leveling: AF
Reticle table: 56-6
CYMER EX Laser
Illumination units:
5EB2 IU
CYMER BMU
SHRINC Printed circuit board
RA: 5EB2 RA6
RLIB-ADP: Straight ARM 6
Ceramic wafer holder, 6"
Control rack
Power rack and power supply
LIA
WL3 Type carrier table: Right
Accessories
Wafer loader: Type 3
Pre-alignment 6: Type 3
Wafer loader 6: Type 3
In-line type: Left
1997 vintage.
NIKON NSR 2205 EX12B is a high-precision, cost-effective deep ultraviolet (DUV) wafer stepper developed specifically for semiconductor lithography. This stepper offers a state-of-the-art resolution of 0.15 microns and a scan speed of up to 2000 wafers/hour. It can be used to manufacture devices with line widths down to 70nm, making it a suitable choice for advanced semiconductor applications. The stepper is designed for a full range of DUV broadband light sources, including the ArF Excimer and F 2 lasers, and can be used for production and development applications. NIKON NSR-2205EX12B is designed with a 13-inch scanner and a 10-stage, linear indexer, making it possible to image exceptionally precise patterns with up to eight exposures per layer. As well, it has a dual-beam scanning system which allows for simultaneous imaging at 10X and 15X mode, enabling the stepper to deliver a superior etch resolution. Its high accuracy and low noise levels ensure an accurate substrate alignment. This stepper is equipped with a highly reliable defect inspection system and has the ability to automatically adjust its scanning parameters to maximize throughput and minimize shot-to-shot size variability. This stepper also offers an array of environmental benefits, including a low operating temperature, vibration-free operation and compatibility with room temperature filters. Additionally, it features an optimized illumination system featuring low power consumption and low noise levels. This stepper is highly compatible with large-capacity plasma generation systems, making it suitable for large-capacity lithography. It also supports off-loading of data to computer-aided design software, enabling users to quickly and accurately make changes to their design. All of these features make NSR-2205 EX12B a cost-effective and reliable option for those working with semiconductors. It is designed for long-term accuracy and precision, and its deep UV imaging capabilities make it suitable for advanced device manufacturing. This stepper is an optimal choice for those looking for a high-performance solution for their wafer imaging requirements.
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