Used NIKON NSR 2205 EX12B #9356972 for sale

NIKON NSR 2205 EX12B Wafer Stepper is a state-of-the-art, high-end wafer stepper for semiconductor-related fabrication processes. With an advanced laser-optimized optical projection equipment and precise alignment capabilities, NIKON NSR-2205EX12B is designed to provide the highest degree of resolution, precision and accuracy during critical semiconductor production steps such as lithography, photoresist development, critical biological and chemical substrates, and photo-resist pattern development. NSR-2205 EX12B is a direct-drive stepper with a 12-inch (305 mm) projection area. It has a numerical aperture (NA) rating of 0.70 and an improved optical setup that produces higher resolution lithography patterns than traditional systems. The table is optically aligned and provides precisely controlled motion, which results in more accurate alignment and consistent batch accuracy. The lens system is fine-tuned for maximum stability and the unit can be configured for dual laser illumination for fine pitch and small features. NIKON NSR 2205EX 12B is capable of producing high-resolution images with a maximum line width of 0.5 micron. This is achieved through the combined use of a new reticle accuracy improvement unit that has improved stage accuracy and an improved scanner control machine. This scanner control tool is capable of handling multiple overlays, which helps prevent photomask alignment errors and improves overlay repeatability. NSR-2205 EX 12 B also boasts a perfectly uniform 24-bit color output panel with a super stable 4,000-level gray level. This allows for better pattern recognition than traditional wafer steppers and enables faster and more efficient lithographic patterning. The unit also features a sophisticated, user-friendly menu-driven Graphical User Interface (GUI), providing operators with quick and easy access to key commands and settings for increased productivity. In summary, NIKON NSR-2205 EX12B is a high-end, precision wafer stepper that is the ideal choice for any semiconductor or microfabrication process. Its improved optical performance, advanced laser-optimized projection asset and precise alignment capabilities ensure superior accuracy, resolution and repeatability.