Used NIKON NSR 2205 EX14C #293603626 for sale

NIKON NSR 2205 EX14C is an advanced Ultraviolet (UV) Wafer Stepper photolithography equipment designed for the production of integrated circuits (ICs) used in various semiconductor manufacturing processes. This system utilizes a combination of advanced optics and precise motion control technologies to accurately project images onto the wafers. The resolution and accuracy of the unit ensure precise alignment of features printed on the wafers. NIKON NSR-2205EX14C is a versatile, high-end wafer stepper machine that is perfect for a wide range of applications. NSR-2205 EX14C Wafer Stepper is equipped with a tool constituent, the NSR-S307E series reduction projection optics, which comprises an optically corrected 4x reduction optical asset. This provides an excellent image quality from close-up to infinity, with an image aspect ratio of 1:1. The optical model contains a pair of rotationally symmetric lenses, one for the object and one for the image. The lenses are optically corrected aspheres which reduce aberrations providing a high-quality image. It utilizes NIKON Electronics Housing Systems (NEHS) which offers a unique approach to the stepper equipment layout and control. The NEHS provides a rigid frame for semiconductor wafer exposures, reduces warpage of the wafer, and enables accurate vacuum venting and maintenance of the wafer surface. The system also features the latest NIKON Image Monitor Unit (IMS), which maintains a precisely aligned image on the wafer's surface regardless of lens and machine element displacement, temperature, and gas composition. NSR 2205 EX 14 C is powered by a high-precision tool controller which ensures high positioning accuracy. This dual central processor asset is capable of processing up to 1,000 electro-optical commands per second, providing extreme responsiveness and accuracy. The stepper is also equipped with NIKON Scaling Drive Model (SDS), which allows the equipment's imaging accuracy to match the design specifications for a variety of lithography processes, including ultrafine line width application. NIKON NSR 2205 EX 14C has the capacity to process substrates ranging up to 200mm in diameter. It is designed with a nitrogen-cooled vacuum cold block and a heated LED exposure source that works in the wavelength range of 365nm to 435nm. Its DLT (Dual Lithography Table) has two tables and is capable of performing wafer exchange scanning at a rate of 30 wafers per hour. In short, NIKON NSR-2205 EX 14 C is an advanced UV Wafer Stepper system with a state-of-the-art optical unit, latest control systems, and high-precision processing capabilities. It is an excellent choice for lithography applications requiring ultrafine line widths, providing superior image quality and accuracy.