Used NIKON NSR 2205 EX14C #9157720 for sale

NIKON NSR 2205 EX14C
Manufacturer
NIKON
Model
NSR 2205 EX14C
ID: 9157720
Wafer Size: 8"
Vintage: 1998
Stepper, 8" 1998 vintage.
NIKON NSR 2205 EX14C is a wafer stepper used for processing wafers. This device provides advanced lithography capabilities for production environments, helping to maximize throughput while minimizing production costs. NIKON NSR-2205EX14C uses a G-line optics system with a short working distance for versatility and high resolution imaging. This stepper also features a 5-step dose control that allows for maximum overlay accuracy and speed. NSR-2205 EX14C can accommodate large substrates in size, from 4-inch to 8-inch wafers, with a 4-inch minimum feature size. It comes equipped with an ultra-high-resolution of 0.10μm, providing excellent edge-of-field uniformity and excellent overlay alignment of different patterns. For local patterning, this wafer stepper comes with a multi-field patterning feature that allows for the patterning of multiple fields with different parameters. In terms of its hardware, NIKON NSR 2205EX 14C comes with an electro-static chuck and an improved vibration resistant stage for processing heavy substrates. The focus memory stores lens positions quickly to enable high-speed operation, while the vibration resistant stage allows for patterning at high speeds. For additional control, this device also features an anti-reflection coating and a built-in air-bearing spindle for more accurate positioning. When it comes to productivity, NIKON NSR 2205 EX 14C has been designed for efficient operation, with a cycle time as low as 1.3 minutes for a 4-inch wafer. The device comes with a built-in harmonic compensation mode to reduce the vibration effects caused by the wafer spinning mechanism. In addition, the wafer stepper provides users with automated maintenance and monitoring, giving you more control over production processes. Overall, NSR 2205EX 14C is an ideal wafer processing tool for production environments. Its advanced lithography features and ultra-high-resolution imaging allow for maximum precision and accuracy. With its long-working distance G-line optics system, multi-field patterning feature, and efficient operation, this wafer stepper can help maximize throughput and lower costs.
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