Used NIKON NSR 2205 EX14C #9209755 for sale

NIKON NSR 2205 EX14C wafer stepper is a highly advanced and powerful lithography equipment tool, providing continuous operation and productivity for lithography processes. NIKON NSR-2205EX14C wafer stepper is used to measure and expose wafers with a resolution up to 0.280 micron. It uses a precision optical equipment, which ranges from incident optical positions up to 24mm as well as up to 14mm exposure for square-shaped wafers. The stepper is equipped with the x2e Rotation exposure system for slightly curved wafers, as well as the Eureki exposure alignment autofocus unit that measures the depth of the wafer. The machine is constructed from an ultra-rigid multi-chamber design featuring mechanical, optical and electrical sub-assemblies for performance and reliability. Its control machine is based on a robust counterweight tool with 6-axis alignment and 11-axis alignment control sensors, for accurate positioning of wafers. NSR-2205 EX14C is also equipped with a collimator asset including both axial scan and transverse scan for achieving exact imaging capability and a full exposure model. In addition, the stepper is designed with a high-speed processing equipment and a large memory capacity to enable high-resolution patterning. NSR-2205EX14C also features a built-in thermal control system with heater modules and cooler modules for efficient cooling and uniform temperature distribution. The stepper is also built with an emission control unit to ensure a clean and pollution-free environment. In addition, the stepper is designed with an automatic protective coating machine that is capable of protecting the wafers from damage during exposure. NSR 2205EX 14C wafer stepper is an efficient and reliable stepper for any lithography needs that call for high-precision imaging. This machine is capable of extracting maximum performance from the latest imaging technologies with its support for resolutions up to 0.280 micron, its x2e rotation exposure tool for curved wafers, its Eureki exposure alignment autofocus asset, its multi-chamber structure, and its high-speed processing model. This machine offers a great deal of user-convenience, robustness, and flexibility.