Used NIKON NSR 2205 EX14C #9251796 for sale

NIKON NSR 2205 EX14C
Manufacturer
NIKON
Model
NSR 2205 EX14C
ID: 9251796
Wafer Size: 8"
Vintage: 1999
Stepper, 8" 1999 vintage.
NIKON NSR 2205 EX14C is a wafer stepper designed to correctly align micro-electronic circuits while reducing semiconductor device sizes. It is an advanced immersion lithography equipment that can produce extremely precise patterns for photomasks. This system is equipped with the latest immersion optics technology, which reduces aberration introduced by a conventional refractive projection optics unit. It also features a highly accurate wafer stage and a high-end, high-accuracy piezo camera machine for improved alignment accuracy. NIKON NSR-2205EX14C's state-of-the-art optics deliver high wafer throughput and feature a numerical aperture (NA) of 1.35. The optics helps ensure high uniformity across the entire field of view. It is capable of a field size up to 10 x 10 mm in the x direction and 6.2 um in the y direction. The tool is designed to pattern up to 180 mm diameter wafers with stage repeatability of 0.6 um in the x and y direction. It also boasts an image focus range of 3-15 mm for varying exposure conditions using stepper or scanner operation. In addition, NSR-2205 EX14C comes with a next-generation Windows XP based user interface that controls exposure and other parameters. This user interface provides a comprehensive overview of the systems exposure conditions, making it easy to quickly adjust settings and ensure accurate results. The interface also includes software tools such as autofocus, auto reticle alignment, and image correction. NSR 2205 EX 14C also features a built-in wafer mark reader. This helps to ensure the part numbers etched onto the wafers are correctly identified and securely stored in the asset logs. Additionally, it is equipped with an advanced cooling unit that reduces internal parts temperature, enhancing model stability and durability. Overall, NIKON NSR 2205 EX 14C is an advanced lithography equipment designed to provide precise alignment and pattern accuracy for advanced semiconductor device fabrication. It features innovative imaging technologies, high-accuracy imaging systems, a user-friendly Windows-based interface, and a built-in wafer mark reader. It is designed for applications such as logic gate lithography and high-density interconnect wiring.
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