Used NIKON NSR 2205 EX14C #9379629 for sale

NIKON NSR 2205 EX14C is a state-of-the-art Wafer Stepper designed to enable accurate and uniform exposure of wafers. It features a 14-inch, 5-micron resolution, class-leading immersion optics and a patented immersion lens which allows for extreme control and accuracy in ultra-fine patterning. NIKON NSR-2205EX14C is designed for cleanroom use and is optimized to process up to 300mm wafer sizes. It is capable of achieving high throughput with maximum process stability and wafer-to-wafer variation. It features an alignment accuracy of 5nm with repeatability of 0.1nm and offers one shot exposure of 10nm structures. NSR-2205 EX14C is powered by a NIKON-exclusive multi-beam optics equipment designed to enable two-dimensional exposures with a single scan. This system also enables low aberration imaging and high transmittance for transparent regions. The booth uses an innovative 6-degree freedom single-arm mechanism which implements a single- ARM filter scanning mechanism to deliver increased image stability and accuracy. The wafer stepper also features a modular I/O board that supports multi-process image capture and parallel image processing. This unit improves throughput and introduces batch-to-batch consistency in production. The stepper utilizes an advanced, high resolution CCD camera with limited exposure time, which allows for quicker processing time without compromising on quality. NSR 2205 EX14C also includes recipe-controlled operations for recipe-style configs and enables memory management for multiple recipes. It also includes an inspection machine to detect and eliminate defective exposure conditions and exposure parameters. The wafer stepper supports the use of optional stage scanners, which can enable full exposure in one operation for complex structures. Finally, a variety of accessories and software are available to utilize the wafer stepper to the fullest. NSR 2205 EX 14C is a powerful tool capable of achieving precise and uniform processing. It is an ideal choice for production of ultra-fine patterns and transparent regions on wafers and other substrates.