Used NIKON NSR 2205 i11D/12D #293794458 for sale

ID: 293794458
Vintage: 1996
Stepper Reticle size: 5" Illumination WL: i-line CD Unifortmity: 400 nm Overlay: 70 nm Illumination uniformity: 2.00% Lens reduction: 1/5 1996 vintage.
NIKON NSR 2205 i11D/12D is a state-of-the-art wafer stepper designed for advanced semiconductor lithography processes. As a critical component in the production of integrated circuits, wafer steppers play a key role in transferring circuit patterns onto silicon wafers with high precision and accuracy. NIKON NSR 2205 i11D/12D is renowned for its cutting-edge technology, robust performance, and unmatched reliability, making it a preferred choice for leading semiconductor manufacturers worldwide. One of the key features of NIKON NSR 2205 i11D/12D is its advanced projection lens equipment, which is essential for achieving the desired resolution and pattern fidelity on the wafer surface. The stepper utilizes a high numerical aperture (NA) lens design, enabling it to project fine patterns with sub-micron accuracy. The NA of the lens determines the ability of the stepper to resolve small features on the wafer, and NIKON NSR 2205 i11D/12D's lens system is optimized for achieving high resolution lithography. In addition to its advanced optics, NIKON NSR 2205 i11D/12D is equipped with a sophisticated alignment and overlay control unit, which ensures precise registration of multiple pattern layers on the wafer. The stepper employs advanced alignment sensors and algorithms to accurately align and overlay the different patterns, allowing for the creation of complex integrated circuits with multiple layers of circuitry. NIKON NSR 2205 i11D/12D is also equipped with an advanced illumination machine that provides uniform and efficient light exposure across the entire wafer surface. This uniform illumination is crucial for ensuring consistent pattern transfer and minimizing pattern distortion or defects. The stepper's illumination tool can be tailored to specific lithography processes, allowing for optimal exposure conditions for various types of photoresist materials. Another key aspect of NIKON NSR 2205 i11D/12D is its throughput and productivity capabilities. The stepper is designed to efficiently process large batches of wafers, enabling high-volume production of semiconductor devices. With its advanced stage technology and high-speed positioning mechanisms, NIKON NSR 2205 i11D/12D can rapidly scan and expose patterns on multiple wafers, maximizing productivity and yield in semiconductor manufacturing. Furthermore, NIKON NSR 2205 i11D/12D incorporates a range of advanced automation features, including robotic wafer handling systems, automated calibration routines, and real-time monitoring and control capabilities. These automation capabilities streamline the lithography process, reduce human intervention, and enhance overall process reliability and repeatability. In summary, NIKON NSR 2205 i11D/12D wafer stepper is a leading-edge lithography tool that offers unparalleled performance, precision, and productivity for semiconductor manufacturing. With its advanced optics, alignment control, illumination asset, and automation features, the stepper delivers exceptional results in patterning complex integrated circuits on silicon wafers. Semiconductor manufacturers rely on NIKON NSR 2205 i11D/12D to drive innovation and advancement in the semiconductor industry, making it an indispensable tool for the production of cutting-edge electronic devices.
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