Used NIKON NSR 2205 i11D #293609472 for sale

Manufacturer
NIKON
Model
NSR 2205 i11D
ID: 293609472
Stepper Resolution: 0.4 µm DOF: 0.6 µm Total focus deviation: ≤0.4 µm Lens inclination: ≤0.2 µm Lens distortion: Within ±50 nm Focus control accuracy: Within ±0.15 µm Illumination uniformity: Within ±2.5% Power: 700 mW/Cm² Reticle blind setting accuracy: Within +0.40 mm to +0.80 mm Reticle rotation: |x|+3s≤20 nm Array orthogonality: Within ±0.1 s Stepping precision: Within 0.040 µm (3σ) Alignment accuracy (LSA, FIA): |Mean|+3s <0.085 µm Wafer pre-alignment repeatability: Within ±1.5 s Wafer flatness: <0.8 µm.
NIKON NSR 2205 i11D wafer stepper is a highly advanced auto-stepping equipment used for advanced lithography processes, as well as high quality imaging of semiconductor wafers. This system utilizes an ultra-high resolution digital camera to acquire the highest quality images of the semiconductor components, then uses a precision step motor to accurately place the photomask and wafer substrate in the desired position. NIKON NSR-2205I11D then takes those images and passes them to a highly advanced auto-stepping processor which is designed to ensure accuracy and consistency across multiple wafer sizes and photomask configurations. The unit combines precision, accuracy and repeatability with a focus on reducing cycle time and minimizing wasted machine resources. This is done by incorporating advanced features such as an advanced loading tool, dual-axis interface, and a lateral shift capability. The dual-axis asset allows for finer image resolution and greater throughput of the lithography process, with a motion range of 30 microns for each axis, and an accuracy of plus or minus 1.4 microns. The lateral shift feature can be used for wafers of different sizes, allowing for consecutive stepping of any size substrate. NSR 2205I11D has a unique drive model which ensures a high rate of throughput for photomask and wafer transfers. It is designed with a dual-motor synchronization feature that lowers the risk of wafer collisions during the stepping process. The stepper also offers advanced wafer lifting capabilities, controlling wafer lifting by positions which allows for the highest possible accuracy. The equipment provides relative stepping accuracy of 0.75 pixel per pixel, and a relative accuracy of 0.5 pixel per pixel. NIKON NSR 2205 I11 D is designed with an advanced communications system and is integrated with on-line monitoring and diagnosis capability. This allows operators to keep up with unit performance and debug potential problems quickly and in a timely manner. Additionally, the machine is designed with a control software suite which provides flexible user control, along with comprehensive tool data analysis and reporting. NSR-2205 I11D is an advanced auto-stepping asset that is highly accurate and ensures high throughput for the best possible imaging results. The model is specifically designed for semiconductor manufacturers and photolithography processes, and is one of the most popular systems in the industry for these applications. Its advanced features make it an ideal choice for those looking for a reliable, accurate and highly efficient auto-stepping equipment.
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