Used NIKON NSR 2205 i11D #293763395 for sale

NIKON NSR 2205 i11D wafer stepper is a precision lithography instrument designed for use in semiconductor device fabrication. It has a minimum resolution of 0.28 microns and a maximum exposure area of 220 mm x 220 mm. NIKON NSR-2205I11D utilizes its proprietary Applied Dose Control (ADC) auto-exposure equipment to ensure repeatable and accurate exposure results regardless of exposure conditions. For accurate pattern registration and alignment, NSR 2205I11D is equipped with a dual reticle autofocus system. This robust unit has both a manual and auto search mode capable of fast and easy acquisition of the target pattern with a small field of view. The alignment accuracy estimate is 0.1 microns (3 sigma). Equipped with 11-inch projection optics and NIKON advanced 5X vibration reduction machine, NIKON NSR 2205 I 11 D has a projection field size of 2.2 um per magnification step. The mini-projection optics allows for higher resolution patterns over a larger area with reduced depth of focus (DOF). The projection lens has a programmable zoom range from 0.2 to 3.0 and a focus range from 0.1 to 4.2 mm. NSR-2205I11D is able to take advantage of this range of magnifications by using what is known as "lateral shift capability," allowing the same mask to be used at different magnifications without requiring a full rotation of the chuck. In terms of throughput, NSR 2205 I11 D features a low track time with a step time of 0.6 seconds and an exposure time of 0.2 seconds. With its high pattern uniformity, NIKON NSR 2205I11D is capable of producing superior product yields with less contamination and rework operations. Additionally, its advanced alignment and overlay capability allows for high level product placement accuracy and batch replication. This enables costlier reticle alignments to be avoided, which helps to increase its cost efficiency. In summary, NSR-2205 I11 D wafer stepper is an advanced lithography tool designed to produce superior results in a wide range of production conditions. Equipped with a small but robust projection lens, dual reticle autofocus asset and an advanced 5X vibration reduction model, NSR 2205 I 11 D is capable of producing resolution up to 0.28 microns and superior product yields with a step time of 0.6 seconds and an exposure time of 0.2 seconds. This, in addition to its excellent alignment and overlay accuracy, makes it an ideal choice for device fabrication.