Used NIKON NSR 2205 i11D #9174897 for sale

NIKON NSR 2205 i11D is a highly advanced molecular stepper equipment designed for use in the fabrication of semiconductor devices. This 5th generation of NIKON wafer steppers is capable of achieving minimum image sizes of 25 nm. It offers a comprehensive range of high performance capabilities, enabling it to meet the demands of the latest nanofabrication techniques. The system provides superior optical resolution of 0.31 super-resolution and 0.8 nm minimum overlay accuracy. It is equipped with a dual-mode field switching unit, allowing it to achieve faster exposure times while maintaining optimal resolution. This is achieved through NIKON i-Tone field enhancement imaging technology. The machine offers a flexible imaging platform, with a range of exposure modes, including single mode, contact mode, and deep UV. Additionally, it supports various high-resolution DUV lenses, including those with numerical aperture (NA) values up to 0.135. This allows for high-precision imaging of structures that may have nanometer dimensions. The tool's Sub-10nm Pattern Control provides precision pattern optimization. This is achieved through its proprietary Wavefront Control technology, used to shape the light beam at a nanometer level. This improves the accuracy and capabilities of NIKON NSR-2205I11D in the fabrication of submicron devices. NSR 2205I11D offers a high-performance Low Particle Generating (LPG) stage. This asset minimizes particle contamination of wafers during exposure or alignment activities, helping to improve device yield and extend the lifespan of critical components. The model also features NIKON unique Field Imaging Equipment (FIS) technology, which allows it to create accurate three-dimensional images of a surface. This is utilized in lithography applications to improve the accuracy and quality of the final product. Overall, NIKON NSR 2205 I 11 D system is an extremely powerful, advanced wafer stepper. It offers excellent imaging capabilities, precise pattern control, and minimal particle generation. Its capabilities make it a valuable tool for semiconductor fabrication activities, providing precise pattern printing, reliable alignment, and accurate imaging of nano-scale structures.