Used NIKON NSR 2205 i11D #9236906 for sale

Manufacturer
NIKON
Model
NSR 2205 i11D
ID: 9236906
Wafer Size: 6"
Stepper, 6" Reticle, 6" (2) Carriers Illumination: SHRINC3 Lamp illumination: Average power: 556.099 mW / cm² Uniformity: 1.126% Lens distortion: ±0.050 µm Maximum: X: 0.032 Y: 0.046 Minimum: X: -0.057 Y: -0.045 Field inclination: Within: 0.35 µm UL-LR, UR-LL: 0.2 µm AST: 0.25 µm Maximum: 0.384 µm Curvature: 0.099 µm UL-LR: -0.160 µm UR-LL: -0.010 µm.
NIKON NSR 2205 i11D is an advanced wafer stepper designed for device manufacturers in need of ultimate accuracy and throughput in the production environment. This wafer stepper utilizes light source technology and precision optics to precisely control the exposure of mask patterns. It can handle up to 4.5 inch wafers and has both a high-resolution scan mode and an ultra-high throughput 'high-speed scan' mode. NIKON NSR-2205I11D wafer stepper utilizes a full field illumination equipment, known as 'NSR Q-Illumination,' that is capable of delivering very uniform light radiation along both the X and Y axes with a stable intensity across the entire field. This system is capable of an even exposure over the entire wafer for all mask patterns, regardless of the pattern size. The illumination unit on this model offers multiple levels of irradiance and focal points, which greatly aids in improved lithographic performance across a wide range of pattern sizes from 0.5 to 10 µm. NSR 2205I11D also utilizes a phase shifter to further fine-tune illumination and can even reduce or ablate notches in poorly shaped portions of mask patterns. The use of this phase shifter allows for more flexibility in controlling the exposure of patterns, allowing for better and more uniform fine feature resolution. The scan mode of this model offers a choice of resolutions, the higher resolution being capable of achieving a 7.5% linear resolution providing clarity and precision to the lithography process. The high-speed scan mode is perfect for high throughput processes as it is capable of scanning up to 30 wafers per hour with an accuracy of 10% linear resolution. The size of this wafer stepper is not just limited to its illumination machine, it also has an auto-loading sample stage which allows for the loading and unloading of wafers effectively and with utmost precision. It also boasts a low-vibration auto-focus stage which allows for precise and accurate detection of the sample surface for optimum exposure results. For those in need of an accurate yet efficient wafer stepper, NIKON NSR-2205 I11D is the perfect choice. It's advanced optics, illumination and scan modes offer precise, uniform and high-speed performance that is invaluable to device manufacturers in the production environment.
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