Used NIKON NSR 2205 i11D #9236907 for sale
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ID: 9236907
Wafer Size: 6"
Stepper, 6"
Reticle, 6"
(2) Carriers
Illumination: SHRINC3
Lamp illumination:
Average power: 496.664 mW / cm²
Uniformity: 0.893 %
Lens distortion: ±0.050 µm
Maximum:
X: 0.065
Y: 0.063
Minimum:
X: -0.066
Y: -0.049
Field inclination:
Within 0.35 µm
UL-LR, UR-LL: 0.2 µm
AST: 0.25 µm
Minimum - maximum: 0.292 µm
Curvature: 0.002 µm
UL-LR: -0.009 µm
UR-LL: -0.016 µm.
NIKON NSR 2205 i11D is a leading-edge wafer stepper, designed to provide high-precision and reliable performance in the semiconductor device fabrication process. The system is able to utilize vision-guided advanced alignment technology, delivering sub-50nm registration accuracy and <3μm overlay accuracy. It is also equipped with NIKON advanced Illumination Correction Technology, allowing for improved productivity by automatically detecting local illumination and maintaining uniformity. Additionally, the integrated intra-field scanner and Enhanced Defocus Transfer Protocol, or EDTP, allows for very quick exposure times of less than 5 seconds. NIKON NSR-2205I11D can support all types of semiconductor processes, including deep ultraviolet lithography, interference lithography, implant lithography and direct write lithography. The system is also capable of achieving high performance in the rapid device fabrication process due to its superior optics and micro-stepping accuracy. NSR 2205I11D can also be used in both dry and immersion lithography, with a wide range of available slit types, allowing for a great deal of flexibility for the end user. Moreover, NSR 2205 I 11 D also offers several operational innovations, such as its Real-time Focus Monitor allowing for focusing accuracy down to ±1nm and Trend Pattern Detection giving early detection of exposure errors. The system is also equipped with NIKON Graphic Language, or NGL, for automated wafer process and programming, as well as DAS, or Delta Auto Search, for absolute alignment. Additionally, the wafer stepper also boasts NIKON unique Helical Micro-step technology, which reduces exposure-induced distortion and increases productivity. In terms of performance, NSR 2205 I11 D offers a range of superior results. Its Rayleigh Interval Optimizer provides a 1.5X to 2X throughput boost compared to conventional lighting solutions. The wafer stepper also has a maximum field size of 105.9mm with 0.6X magnification and a minimum field size of 41.1mm with 4X magnification. Its Step and Repeat Resolution range is achievable down to 0.112μm, allowing for incredibly fine resolution. All in all, NIKON NSR-2205 I11D offers superb performance in device fabrication, as well as a range of features and performance enhancements which our highly sought after in this field. Whether used for larger scale production or for small-scale prototyping and development, NIKON NSR-2205 I11 D factor in the new features and technologies available, providing superior performance and reliability for end users.
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