Used NIKON NSR 2205 i11D #9237613 for sale

NIKON NSR 2205 i11D Wafer Stepper is a sophisticated, high-performance imaging equipment designed to meet the demands of advanced semiconductor device fabrication processes. This system is a reliable, cost-effective imaging solution that delivers enhanced throughput and excellent resolution. NIKON NSR-2205I11D Wafer Stepper features a state-of-the-art KrF excimer laser exposure unit, which is designed for high-precision imaging with large exposure fields. The exposure source consists of a 150mm-diameter quartz subframe, containing a KrF excimer laser with an output power of up to 250 mW. The laser exposure time can be precisely controlled within a range of 25 -6000 ms. NSR 2205I11D Wafer Stepper has an excellent alignment accuracy, with submicron XY resolution and a repeatability of +/- 0.5um. Its positioning machine is a product of NIKON patented High-Axes DDM (Dual DualMotor) design, as well as linear motors, extending both the accuracy and the maximum acceleration. In addition to precise alignment, an adjustable focusing mechanism also guarantees an optimum focus independent of the wafer topography. NIKON NSR 2205I 11D Wafer Stepper is an extremely precise imaging tool. It can handle wafers up to 12" in diameter and the wafer library is situated outside the cleanroom. Automated processes are possible due to the enclosed software and automated alignment and focus functions. For advanced device fabrication applications, NSR-2205 I11 D Wafer Stepper features built-in OPC, as well as design-rule-check functions. Comments and measurements are possible with NIKON NSR 2205 I 11 D Wafer Stepper. The asset is equipped with a PC interface for remote control and operation. Furthermore, NIKON provides automated defect inspection capability and wafer pattern measurement, which are essential for advanced device fabrication processes. NIKON NSR-2205 I11 D Wafer Stepper is an essential tool for any advanced semiconductor device fabrication process. Its state-of-the-art imaging model and excellent precision provide high-accuracy imaging and production of advanced semiconductor devices.