Used NIKON NSR 2205 i11D #9245445 for sale
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ID: 9245445
Wafer Size: 8"
Vintage: 1994
Stepper, 8"
Basic version:
MCSV Basic: 2.10A
Option version: OCS
Main system: 2020A
Main computer: Vax 4000 96
Hard Disk Drive & storage drive included
Illumination type: No shrinc
Wafer stage:
Chuck type: 4" (PSS)
Screw type: Ball
Reticle alignment: VRA & ISS
Reticle microscope: Fix
Auto focus: Multipoint
Wafer loader:
Wafer size: 4"
Loader type: Single
OF Type: Flat
Flat zone: Flat
In-line: Left
Cassette: Center & right
Control rack position: Right
(6) Reticle loaders
No extend library
13 Slot
No PPD
No barcode system
Chamber type: ASAHI
Lens data:
Long term focus stability: Within 0.25 um
Magnification control vs. & lens heat focus Div.:
Mag: ≤ 0.02 um
Focus: ≤ 0.2 um
Auto focus repeatability: ± 0.1 um
Focus calibration 2 repeatability: 3δ ≤0.10 um
Lens distortion (Including magnification): Within ± 0.055 um
Lens stability: Within ± 0.050 um
Reticle blind setting accuracy: + 0.4 to + 0.8 mm (On reticle)
Exposure power: 650 mW/cm²
Intergrated exposure control: Within ± 1.0%
Illumination uniformity: Within 2.5%
Reticle rotation: Abs & Rep within 20 nm
Array orthogonality: Within ± 0.1 sec
Stepping precision: Within 0.05 um (3δ)
Alignment accuracy:
LSA: |X| + 3δ < 0.075 um (Center position)
FIA: |X| + 3δ < 0.075 um (Center position)
Stepping rate: < 20 Sec (4" Base)
Wafer Pre-alignment 2 repeatability: 3δ < 25 um
Throughput with Pre-alignment 2:
LSA: EGA ≥ 50 Wafer / hr
FIA: EGA ≥ 50 Wafer / hr
System throughput: Within 83.7 sec / Wafer (4" Base)
Chip leveling accuracy: Within ± 1.5 sec
Chip leveling control time:
Angle at 10 sec within 280 msec
Angle at 30 sec within 610 msec
Angle at 50 sec within 940 msec
Operation test:
Wafer system: > 99%
Reticle: > 100%
1994 vintage.
NIKON NSR 2205 i11D is a high-precision wafer stepper that provides automation to wafer resist exposure processes. This machine uses of NIKON patented ASM (Auto-Smoothing Motor) to ensure superior imaging quality and high throughput. The included i-Line lithography pattern generator has a resolution of 0.8 μm, allowing for exposure of resist patterns with high accuracy and repeatability. NIKON NSR-2205I11D utilizes a mirror to dynamically adjust the imaging beam focal position, thus providing high quality images consistently. This equipment also features high-speed dosing with a feedback control system utilizing reference wafers. The included high throughput exposure mode reduces imaging exposure times up to 10% over the traditional mode for increased imaging cycles and productivity. This machine features a highly stable frame construction which allows for a maintenance free operation in a high temperature and vibration environment. NSR 2205I11D also has a low power consumption, allowing for a significant reduction in energy costs. The included Digital Image Measurement Unit (DIMS) ensures monitoring and adjustment of resist exposure values from wafer-to-wafer to maintain high quality images. This wafer stepper includes an auto exposure enabling machine, which simplifies the exposure of small area patterns. There is also an exposure history monitoring tool which allows the user to review the results of previous exposures. The included vibration and particle counter improves the detection accuracy of particles, thus reducing maintenance needs. The i11D is also equipped with an operations monitoring asset to automatically detect and report irregularities and model problems. Overall, NIKON NSR 2205 I 11 D is a high-precision wafer stepper with advanced features that provide wafer resist exposure automation and high accuracy, as well as reliable performance in high temperature and vibration environments. With its low power consumption and automated exposure equipment, it is an excellent tool for the production of high quality images with a consistent, repeatable results.
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